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AMAT 150-20464

Product Introduction: This is a key and highly sophisticated part for semiconductor lithography equipment. Lithography is a critical step in semiconductor manufacturing, where the patterns of integrated circuits are transferred onto semiconductor wafers. This component is responsible for the precise control of the mask movement and positioning during the exposure process. Its performance directly affects the resolution and accuracy of the pattern transfer, which in turn determines the quality and performance of the final semiconductor devices.

AMAT 0190-09264

Product Introduction: This is a highly specialized and precision - engineered component specifically tailored for the semiconductor manufacturing industry. In the complex and demanding environment of semiconductor production, where even the slightest deviation can lead to significant product defects, this component serves as a cornerstone for ensuring the smooth and accurate operation of various manufacturing equipment. It is designed to withstand the rigorous conditions of the production line, including high temperatures, high pressures, and exposure to various chemicals. Technical Specifications:

  • Dimensional Tolerance: It adheres to extremely strict dimensional tolerances, often in the sub - micrometer range. This ensures a perfect fit within the manufacturing equipment, eliminating any potential for misalignment that could disrupt the production process. For example, the length and width dimensions are controlled to within ±0.001 mm, and the thickness to within ±0.0005 mm.

AMAT 0050-25949

Product Name: Chamber View Port / Optical Window Product Introduction: A transparent assembly installed in the chamber wall or lid to allow visual inspection, optical pyrometry, or laser-based diagnostics to monitor the process inside the vacuum chamber. Technical Specifications:

  • Window Material: Fused Silica (Quartz), Sapphire, or Borosilicate Glass.

AMAT 0040-03508

Product Name: RF Match Network (Impedance Match) Product Introduction: An impedance matching network situated between the RF Generator and the Plasma Chamber. Its purpose is to maximize power transfer by matching the 50-ohm output of the generator to the varying impedance of the plasma load. Technical Specifications:

  • Frequency: 13.56 MHz (fixed or tunable).
  • Power Handling: 1000W to 10kW.

AMAT 0010-30904

Product Name: Mass Flow Controller (MFC) - Gas Line Product Introduction: A device used to measure and control the flow rate of a specific process gas entering the chamber with high precision. It is essential for repeatable process recipes. Technical Specifications:

  • Gas Compatibility: Corrosive (Cl2, HBr, WF6) or Non-corrosive (Ar, N2, O2).
  • Flow Range: 10 sccm to 5000 sccm (standard cubic centimeters per minute).

AMAT 0140-02533

Product Name: Throttle Valve Body Assembly Product Introduction: A precision valve used to control the pressure inside the vacuum chamber by regulating the pumping speed. It is a key component for maintaining process stability. Technical Specifications:

  • Type: Butterfly valve or Poppet valve.
  • Size: 6-inch, 8-inch, or 12-inch nominal diameter.
  • Material: Aluminum body with anodized coating; Seals made of Viton, Kalrez, or metal (for high temp).

AMAT 0020-32963

Product Name: Pedestal Lift Mechanism (Z-Axis Drive) Product Introduction: The mechanical assembly responsible for raising and lowering the process pedestal (where the wafer sits) to engage with the vacuum robot or to position for process recipes. Technical Specifications:

  • Drive Type: Ball screw or Roller screw linear actuator.
  • Motor: Brushless DC servo motor or Stepper motor.

AMAT 0020-21755

Product Name: Focus Ring Assembly Product Introduction: A component placed around the perimeter of the wafer on the pedestal. It confines the plasma to the wafer area and protects the edge of the wafer and the chamber from deposition/etch. Technical Specifications:

  • Material: Silicon, Silicon Carbide, or Quartz.
  • Inner Diameter: Matches wafer diameter (e.g., 300mm) with a tight tolerance (±0.1mm).

AMAT 0150-76735

Product Name: Electrostatic Chuck (ESC) Assembly Product Introduction: A high-voltage device used to hold a semiconductor wafer firmly in place on a pedestal during processing using electrostatic force. It replaces mechanical clamping which causes particle issues. Technical Specifications:

  • Diameter: 300mm (12-inch) standard.
  • Clamping Voltage: 0V to 2000V DC (bipolar or monopolar).

AMAT 0020-19002

Product Name: Process Chamber Liner (Chamber Shield) Product Introduction: A consumable protective shield installed on the inner walls of a vacuum process chamber. It protects the expensive main chamber body from plasma erosion, deposition, and chemical corrosion. Technical Specifications:

  • Material: Aluminum, Aluminum Nitride (AlN), or Silicon Carbide (SiC) depending on process severity.
  • Coating: Yttrium (Y) or Yttria-Alumina for plasma spray resistance.
  • Thickness: 5mm to 20mm.

AMAT 0021-85102

Product Name: Endura Vacuum Robot Blade Product Introduction: A critical handling component used within the vacuum transfer modules of Endura cluster tools. It is the specific end-effector that physically contacts the semiconductor wafer to move it between process stations. Technical Specifications:

  • Material: Carbon fiber reinforced PEEK or Ceramic for low particle generation.
  • Dimensions: Custom geometry to fit specific wafer sizes (200mm or 300mm).

AMAT 0100-91085

Product Name: RF Power Supply Generator (13.56 MHz) Product Introduction: A high-precision Radio Frequency (RF) generator designed to deliver stable power to plasma chambers. It is a core component for generating and sustaining plasma in etching and deposition processes. Technical Specifications:

  • Frequency: 13.56 MHz (standard industrial frequency).
  • Power Output: 1000 Watts to 5000 Watts (configurable).
  • Voltage: 208V/230V/400V AC three-phase input.