Shop

You are here:
  1. Home
  2. Shop
  3. Page 574

AMAT 0030-56789

Product Introduction: This semiconductor wafer cleaning system is a state - of - the - art piece of equipment designed to thoroughly clean semiconductor wafers at various stages of the manufacturing process. It utilizes advanced cleaning technologies to remove contaminants such as particles, organic residues, and metal ions from the wafer surface, ensuring high - quality semiconductor device fabrication. Technical Specifications:

  • Cleaning Chamber Dimensions: The cleaning chamber has an internal diameter of [D] millimeters and a height of [H] millimeters

AMAT 0010-27345

Product Introduction: This vacuum pump is an essential component in semiconductor manufacturing equipment that requires a vacuum environment for various processes such as deposition, etching, and packaging. It is designed to efficiently evacuate the air and other gases from the process chamber, creating a high - vacuum or low - vacuum environment as required by the specific process. Technical Specifications:

  • Pump Type: It is a [Type of pump, e.g., dry scroll pump, turbo - molecular pump] depending on the specific application requirements.

AMAT 0020-13713

Product Introduction: This high - precision wafer stage is a core component in semiconductor manufacturing equipment, providing a stable and accurate platform for semiconductor wafers during various processing steps such as lithography, inspection, and metrology. It enables precise positioning and movement of the wafer to ensure that the processing is carried out at the correct locations on the wafer surface. Technical Specifications:

  • Material: Constructed from a combination of high - strength aluminum alloys and granite. The aluminum alloy parts are used for the moving components to reduce weight and improve

AMAT 0040-04048

Product Introduction: This gas flow controller is an essential component in semiconductor manufacturing equipment that requires precise control of gas flow rates. It is used to regulate the flow of various process gases such as silane, ammonia, and chlorine gases during different semiconductor processing steps, ensuring the stability and repeatability of the processes. Technical Specifications:

  • Flow Range: Can control the gas flow rate in the range of [F] sccm (standard cubic centimeters per minute) to [G] slm (standard liters per minute).

AMAT 0040-46381

Product Name: AMAT 0040 - 46381 Semiconductor Wafer Inspection System Optics Module Product Introduction: This optics module is a key component of a semiconductor wafer inspection system. It is responsible for capturing high - resolution images of the wafer surface to detect defects such as scratches, particles, and pattern irregularities. The quality of the images captured by this module directly affects the accuracy and efficiency of the wafer inspection process. Technical Specifications:

  • Optical Components: Comprises a high - quality objective lens with a numerical aperture (NA) of [W].

AMAT 0200-07496

Product Name: AMAT 0200 - 07496 Advanced Vacuum Chamber for Semiconductor Processing Product Introduction: This is a high - performance vacuum chamber designed for semiconductor manufacturing processes that require a clean and controlled vacuum environment. It provides a sealed space where various semiconductor processing steps such as deposition, etching, and annealing can be carried out with high precision and minimal contamination. Technical Specifications:

  • Material: Constructed from high - purity stainless steel (e.g., 316L) with a low outgassing rate.

AMAT 0010-09068

Product Name: AMAT 0010 - 09068 High - Precision Semiconductor Wafer Handling Arm Product Introduction: This is a high - precision mechanical component specifically designed for semiconductor manufacturing equipment, especially for wafer handling systems. It serves as a critical link in the process of moving semiconductor wafers between different stations within the equipment, ensuring smooth and accurate transfer without causing any damage to the delicate wafers. Technical Specifications:

  • Material: Utilizes a high - strength, lightweight aluminum alloy with a special surface treatment to enhance wear resistance and reduce the risk of particle generation.

AMAT 0070-33662

  • Product Name: AMAT 0070 - 33662 Semiconductor Wafer Handling End - Effector with Sensor Integration
  • Product Introduction: The AMAT 0070 - 33662 is an advanced end - effector designed for semiconductor wafer handling robots. It is equipped with integrated sensors to enhance the precision and safety of wafer handling operations. In semiconductor manufacturing, accurate and gentle wafer handling is essential to prevent wafer damage and ensure high - yield production.
  • Technical Specifications:
    • Material: Made of a high - strength, lightweight carbon - fiber composite material with a special non - slip coating on the wafer contact surface.

AMAT 0060-22552

  • Product Name: AMAT 0060 - 22552 Semiconductor Process Gas Purification System
  • Product Introduction: The AMAT 0060 - 22552 is a gas purification system designed to remove impurities from process gases used in semiconductor manufacturing. High - purity process gases are essential for ensuring the quality and reliability of semiconductor devices, as even trace amounts of impurities can cause device defects and reduce yield.
  • Technical Specifications:
    • Purification Technology: Uses a combination of physical and chemical purification methods, including gettering, adsorption

AMAT 0050-15442

  • Product Name: AMAT 0050 - 15442 Semiconductor Wafer Temperature Control Module
  • Product Introduction: The AMAT 0050 - 15442 is a temperature control module designed to maintain precise temperature conditions for semiconductor wafers during various manufacturing processes. Temperature control is critical in semiconductor processes such as deposition, etching, and annealing, as it directly affects the quality and performance of the deposited films and the overall device characteristics.
  • Technical Specifications:
    • Temperature Range: Can control the wafer temperature in the range of - 50°C to 300°C, covering a wide range of process requirements.

AMAT 0040-20332

  • Product Name: AMAT 0040 - 20332 Chemical Delivery Pump for Semiconductor Processes
  • Product Introduction: The AMAT 0040 - 20332 is a high - precision chemical delivery pump used in semiconductor manufacturing processes. It is responsible for accurately and reliably delivering various chemicals, such as photoresists, developers, etchants, and cleaning agents, to different process stations in a semiconductor fab. The precise control of chemical delivery is crucial for ensuring consistent process results and high - quality semiconductor devices.
  • Technical Specifications:
    • Pump Type: It is a diaphragm - type pump, which provides excellent chemical compatibility and can handle a wide range of corrosive and abrasive chemicals.

AMAT 0040-10122

  • Product Name: AMAT 0040 - 10122 Semiconductor Wafer Cleaning Nozzle
  • Product Introduction: The AMAT 0040 - 10122 is a specialized nozzle designed for semiconductor wafer cleaning processes. In semiconductor manufacturing, wafer cleaning is a crucial step to remove contaminants such as particles, organic residues, and metal ions from the wafer surface before and after various processing steps. This nozzle plays a vital role in delivering cleaning fluids effectively and uniformly to ensure high - quality cleaning results.
  • Technical Specifications:
    • Material: Constructed from high - purity polyether ether ketone (PEEK) and stainless steel. PEEK offers excellent chemical resistance to a wide range of cleaning chemicals, while stainless steel provides structural strength and durability.