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AMAT 0021-12737 Chamber Insulator Ring

Product Overview: The AMAT 0021-12737 is a high-performance chamber insulator ring designed for use in the process chambers of Applied Materials semiconductor equipment. It serves as an electrical insulator and thermal barrier, separating high-voltage components from the chamber body and preventing heat transfer between different chamber zones. This insulator ring is manufactured from advanced ceramic materials, ensuring excellent electrical insulation, high-temperature resistance, and plasma erosion resistance. It is a critical component for maintaining the integrity of the process chamber, ensuring safe operation and consistent process performance.
Technical Specifications: - Material Composition: High-purity alumina (Al₂O₃) ceramic with a purity of 99.99%, offering excellent electrical insulation and thermal stability. - Dimensions: Outer diameter 150mm, inner diameter 120mm, thickness 10mm, with a surface roughness ≤ 0.2 μm. - Electrical Insulation: Volume resistivity ≥ 1×10¹⁴ Ω·cm at 25°C, ensuring effective electrical isolation between high-voltage components.

AMAT 0190-77389 High-Precision Optical Fiber Thermometer Assembly

Product Overview: The AMAT 0190-77389 is a high-precision optical fiber thermometer assembly designed for temperature monitoring in Applied Materials semiconductor processing equipment. It provides accurate, real-time temperature measurements of critical components such as process chambers, wafers, and heaters, ensuring optimal process control and component protection. This assembly leverages advanced optical fiber technology to withstand high temperatures, plasma exposure, and electromagnetic interference, making it ideal for the harsh environments of semiconductor fabs. It integrates seamlessly with AMAT’s equipment control systems, enabling closed-loop temperature control and process optimization.
Technical Specifications: - Temperature Range: -50°C to 800°C, covering the full range of temperatures encountered in semiconductor processing. - Accuracy: ±0.5°C (at 0-500°C), ensuring precise temperature measurement for process control. - Response Time: ≤10ms, providing real-time temperature feedback to the equipment control system. - Optical Fiber Type: Single-mode fiber with a core diameter of 10μm, ensuring minimal signal loss and high measurement stability.

AMAT 0021-08690 Precision Mechanical Fastener Assembly

Product Overview: The AMAT 0021-08690 is a high-precision mechanical fastener assembly designed exclusively for Applied Materials semiconductor equipment. It is used to securely fasten critical components such as chamber liners, electrodes, and sensor mounts, ensuring structural stability and alignment in high-vacuum, high-temperature environments. This assembly is engineered with high-strength materials and precise machining to meet AMAT’s strict performance standards, providing reliable fastening even under the harsh operating conditions of semiconductor fabs. It is a key component for maintaining equipment integrity and preventing component displacement during high-speed operation or thermal cycling.
Technical Specifications: - Material Composition: Heat-treated 17-4 PH stainless steel, offering high tensile strength (1100 MPa) and excellent corrosion resistance. - Fastener Type: Captive screw assembly with a integrated washer, designed to prevent loosening under vibration.

AMAT 0050-21118 Gas Line Weldment

Product Overview: The AMAT 0050-21118 is a custom-engineered gas line weldment specifically designed for Applied Materials semiconductor manufacturing equipment. It serves as a critical component in the gas delivery system, responsible for securely connecting and transporting process gases between different modules of the equipment. This weldment is manufactured to strict OEM standards, ensuring seamless integration with AMAT’s gas delivery systems and maintaining the high purity and integrity required for semiconductor processing. It is a new component that meets all of AMAT’s original specifications, providing reliable performance in harsh fab environments.
Technical Specifications: - Material Composition: High-purity 316L stainless steel, selected for its excellent corrosion resistance and compatibility with a wide range of process gases, including reactive and corrosive varieties. - Weld Quality: Precision TIG (Tungsten Inert Gas) welding, ensuring leak-tight joints with a leak rate ≤ 1×10⁻⁹ Pa·m³/s (He) to prevent gas leakage and contamination.

AMAT 9090-01247 Equipment Cooling System Heat Exchanger

Product Overview: The AMAT 9090-01247 is a high-efficiency heat exchanger designed for use in the cooling systems of Applied Materials semiconductor equipment. It is responsible for removing heat generated by internal components (e.g., RF power supplies, process chambers, motors) to maintain optimal operating temperatures and prevent equipment overheating. This heat exchanger is engineered with advanced heat transfer technology and corrosion-resistant materials to ensure efficient heat dissipation, long-term reliability, and compatibility with semiconductor cleanroom environments.
Technical Specifications: - Heat Transfer Capacity: 5000 W (typical), with a maximum capacity of 7000 W. - Cooling Medium: Deionized water (DI water) or ethylene glycol/water mixture (50/50), compatible with AMAT’s cooling systems.

AMAT V051-1/4 Precision Pressure Regulator

Product Overview: The AMAT V051-1/4 is a high-precision pressure regulator designed for use in the gas delivery and vacuum systems of Applied Materials semiconductor equipment. It is responsible for reducing and stabilizing the pressure of process gases or vacuum systems, ensuring that the correct pressure is maintained throughout the semiconductor manufacturing process. This regulator is engineered with high-purity materials and precision control mechanisms to deliver exceptional pressure stability, minimal pressure drop, and compatibility with harsh process gases, making it a critical component for process consistency.
Technical Specifications: - Pressure Range: Inlet pressure: 0.1-10 MPa (14.5-1450 psi), outlet pressure: 0-1 MPa (0-145 psi), adjustable with a precision of ±0.001 MPa. - Pressure Stability: ±0.1% of set pressure over 24 hours, ensuring consistent process conditions. - Material Composition: Body made of 316L stainless steel (electropolished internal surface, surface roughness ≤ 0.1 μm), diaphragm made of Hastelloy C-276 for corrosion resistance.

AMAT 0150-01969 RF Power Supply Module

Product Overview: The AMAT 0150-01969 is a high-performance RF (Radio Frequency) power supply module designed exclusively for Applied Materials semiconductor equipment. It provides stable, precise RF power to the plasma generation modules, enabling the excitation and sustainment of plasma for semiconductor processing (e.g., etching, deposition). This module is engineered to deliver consistent power output, withstand harsh industrial environments, and integrate seamlessly with AMAT’s equipment control systems, making it a critical component for ensuring process quality and efficiency.
Technical Specifications: - RF Frequency: 13.56 MHz (standard), with optional 27.12 MHz or 40.68 MHz configurations. - Power Output: 1000W (continuous wave), with adjustable power range: 0-1000W (step size: 1W)

AMAT 0010-75533 Precision Wafer Handling Arm

Product Overview: The AMAT 0010-75533 is a precision wafer handling arm designed for use in the automatic wafer handling systems of Applied Materials semiconductor equipment. It is responsible for the precise picking, placing, and transferring of wafers between equipment modules (e.g., load locks, process chambers, inspection stations) in a semiconductor fab. This handling arm is engineered with lightweight, high-rigidity materials and advanced positioning technology to ensure minimal wafer damage, high handling efficiency, and compatibility with cleanroom environments.
Technical Specifications: - Material Composition: Arm body made of carbon fiber composite (or optional high-strength aluminum alloy) for lightweight (weight: 0.5kg) and high rigidity (modulus of elasticity: 230 GPa). - Surface Treatment: Anti-adhesive, anti-static coating (surface resistance: 10⁶-10⁹ Ω) to prevent wafer adhesion and particle generation.

AMAT 0040-21402 Precision Gas Delivery Manifold

Product Overview: The AMAT 0040-21402 is a precision gas delivery manifold designed for use in the gas path systems of Applied Materials semiconductor equipment. It is responsible for the precise transportation, distribution, and control of process gases, ensuring that the correct gas composition and flow rate are delivered to the process chamber during semiconductor manufacturing. This manifold is engineered with high-purity materials and precision machining to minimize gas adsorption, particle generation, and leakage, making it a critical component for maintaining process consistency and wafer quality.
Technical Specifications: - Material Composition: Manifold body made of high-purity 316L stainless steel (ASTM A240) with electropolished internal surface (surface roughness ≤ 0.1 μm) to prevent gas adsorption and particle generation.

AMAT 9090-01060 Semiconductor Equipment Chassis/Enclosure

Product Overview: The AMAT 9090-01060 is a robust, high-performance chassis/enclosure designed to house and protect the internal precision components, electrical cabinets, and control modules of Applied Materials semiconductor equipment. It is engineered to meet the strict requirements of semiconductor cleanroom environments, providing dustproof, waterproof, anti-corrosion, and electromagnetic shielding capabilities. This chassis/enclosure not only ensures the safety and integrity of internal components but also facilitates equipment installation, maintenance, and heat dissipation, making it a critical structural component of AMAT’s semiconductor equipment.
Technical Specifications: - Material Composition: High-strength 5052 aluminum alloy (or optional cold-rolled steel for heavy-duty applications), with a tensile strength of 230 MPa and yield strength of 190 MPa.

AMAT 0041-12339 Plasma Process Electrode Assembly

Product Overview: The AMAT 0041-12339 is a high-performance plasma process electrode assembly designed for use in the plasma generation and processing modules of Applied Materials semiconductor equipment. It is a critical component that directly participates in plasma excitation, ion acceleration, and wafer surface processing, playing a key role in determining the quality and uniformity of semiconductor thin films and etched features. This electrode assembly is engineered with high-purity materials and advanced coating technology to withstand the harsh plasma environment, ensuring long-term stability and consistent process performance.
Technical Specifications: - Material Composition: Electrode core made of high-purity graphite (99.999% purity) or silicon carbide (SiC) for excellent thermal conductivity and plasma resistance; surface coating: TiN (titanium nitride) or Al₂O₃ (aluminum oxide) coating (thickness: 5-10 μm) for enhanced wear resistance and plasma erosion resistance.

AMAT 0680-01972 Ultra-High Vacuum (UHV) Valve Component

Product Overview: The AMAT 0680-01972 is a high-performance ultra-high vacuum valve component designed for use in the vacuum subsystems of Applied Materials semiconductor equipment. It is responsible for controlling the vacuum path, isolating process chambers from vacuum pump systems, and maintaining the ultra-high vacuum environment required for semiconductor processing. This component is engineered with precision machining and advanced sealing technology to ensure exceptional air tightness, durability, and compatibility with harsh process gases. It is a critical part of AMAT’s vacuum systems, enabling reliable and consistent semiconductor manufacturing processes.
Technical Specifications: - Vacuum Rating: Ultra-high vacuum (UHV) with a base pressure ≤ 1×10⁻⁹ Pa, leak rate ≤ 1×10⁻¹² Pa·m³/s (He). - Material Composition: Body made of 316L stainless steel (ASTM A240) for excellent corrosion resistance and high-temperature stability; sealing material: copper gasket (or optional Viton for specific gas compatibility).