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Gasonics 90-1031-01 Process Controller

Introduction: The Gasonics 90-1031-01 is an electronic control module, likely a Programmable Logic Controller (PLC) or a dedicated process control interface card. It serves as the "brain" for a specific subsystem within the Gasonics tool, managing sequences, interlocks, and analog I/O. Technical Specifications:

  • Type: Industrial Controller / PCB Assembly
  • CPU: 32-bit or 64-bit Processor

Gasonics 95-2736 Vacuum Throttle Valve

Introduction: The Gasonics 95-2736 is a precision vacuum throttle valve used to regulate the pressure inside a process chamber by controlling the pumping speed. It allows for precise control of gas flow conductance between the chamber and the vacuum pump. Technical Specifications:

  • Valve Type: Pneumatically actuated butterfly or poppet valve
  • Port Size: ISO-K or ISO-F flange (e.g., 6-inch, 8-inch)

Gasonics A95-006-01 Matching Network

Introduction: The Gasonics A95-006-01 is a printed circuit board (PCB) assembly or sub-module that forms the control logic for an RF impedance matching network. It processes feedback signals from the plasma chamber and drives motorized capacitors or variable inductors to achieve a 1:1 Standing Wave Ratio (SWR). Technical Specifications:

  • Function: Automatic Impedance Matching Control
  • Input Signals: Forward Power, Reflected Power, Phase Angle

Gasonics 0510X-LA24-ABA Inductive Sensor

Introduction: The Gasonics 0510X-LA24-ABA is an industrial-grade inductive proximity sensor. It is used to detect the presence of metallic objects (such as wafers, robot arms, or chamber lids) without physical contact. It operates on the principle of electromagnetic induction, generating an oscillating field that is dampened when a metal target enters the sensing range. Technical Specifications:

  • Sensing Principle: Inductive (Oscillator-based)
  • Housing Size: M12 or M18 cylindrical barrel (Standard industrial size)

Gasonics A90-005-02 RF Generator (13.56 MHz)

Introduction: The Gasonics A90-005-02 is a solid-state or tube-based RF generator operating at the standard 13.56 MHz frequency. It is the primary source of electromagnetic energy used to create and sustain plasma within the processing chamber. This generator is known for its reliability and precision in power delivery. Technical Specifications:

  • Type: RF Power Generator (Solid State or Tetrode)
  • Frequency: 13.56 MHz ± 0.005%

Gasonics 12-300000-30 High Voltage Power Supply (HVPS)

Introduction: The Gasonics 12-300000-30 is a specialized high voltage power supply module designed to provide the necessary electrical potential for plasma ignition or ion acceleration within Gasonics process tools. It converts standard facility power into high-voltage DC or pulsed output required to sustain specific plasma densities. Technical Specifications:

  • Output Voltage: 0 to 30 kV DC (adjustable)
  • Output Current: Up to 100 mA (depending on load)

Gasonics AWD-D-2-8-5-003 Pneumatic Diaphragm Valve

Introduction: The Gasonics AWD-D-2-8-5-003 is a high-purity pneumatic valve assembly designed for precise control of process gases or vacuum lines within semiconductor manufacturing equipment. It utilizes a diaphragm mechanism to isolate the actuator from the process media, ensuring no contamination and leak-tight operation. Technical Specifications:

  • Valve Type: 2-way or 3-way Pneumatic Diaphragm Valve
  • Port Size: Typically 1/4 inch VCR or Swagelok fitting

Gasonics 16025-02 Process Chamber Liner

Introduction: The Gasonics 16025-02 is a protective consumable component, typically serving as a chamber liner or shield. It is installed inside the plasma processing chamber to protect the main chamber walls and expensive internal components from chemical corrosion, physical sputtering, and particle contamination generated during high-energy plasma processes. Technical Specifications:

  • Material: High-purity Aluminum (Al 6061-T6), Anodized Aluminum, or Quartz (depending on specific chemistry)

Gasonics A97-127-01 RF Impedance Matching Network

Introduction: The Gasonics A97-127-01 is a critical radio frequency (RF) component designed for use in Gasonics plasma stripping and cleaning systems. It functions as an impedance matching network or a part of the RF generation subsystem, ensuring that maximum power is transferred from the RF generator to the plasma chamber. This component is essential for maintaining plasma stability during high-precision photoresist ashing and surface cleaning processes. Technical Specifications:

  • Frequency Range: 13.56 MHz (Standard Industrial ISM Band)

AMAT 0190-16892

  • Product Introduction: The metrology and inspection system is a vital tool in semiconductor manufacturing for measuring various physical and electrical parameters of semiconductor wafers and devices, as well as detecting defects. It provides critical data for process control, quality assurance, and yield improvement.
  • Technical Specifications:
    • Measurement Accuracy: It can achieve high measurement accuracy for different parameters. For example, in film thickness measurement

AMAT 0190-15679

  • Product Introduction: The wafer cleaning system is an essential part of semiconductor manufacturing to remove contaminants such as particles, organic residues, and metal ions from the wafer surface. A clean wafer surface is crucial for ensuring high - quality semiconductor device fabrication, as any contaminants can lead to device defects and reduced performance.
  • Technical Specifications:
    • Cleaning Methods: It supports multiple cleaning methods, including wet cleaning (using chemical solutions such as sulfuric acid - hydrogen peroxide mixtures (SPM)

AMAT 0190-14235

  • Product Introduction: This plasma generation system is a key part of semiconductor manufacturing equipment that utilizes plasma - based processes, such as plasma - enhanced chemical vapor deposition (PECVD) and reactive ion etching (RIE). It is responsible for generating a stable and controlled plasma environment within the process chamber, which is essential for the efficient and uniform performance of these processes.
  • Technical Specifications:
    • Power Output: The system can provide a power output ranging from 100W to 5000W, depending on the process requirements.