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AMAT 0150-14869

Product Name: Chamber Liner and Shield Kit for PVD Impulse Systems Product Introduction: This is a comprehensive consumable kit designed for the Applied Materials Impulse PVD platform, serving as the primary sacrificial barrier protecting the stainless steel chamber walls from physical sputtering, chemical corrosion, and thermal stress. The kit typically includes the main chamber liner, collimator shields, and dark space shields. By absorbing the deposition and preventing material flaking, it ensures particle-free processing and maintains the vacuum integrity of the system. The material selection and surface engineering are optimized to reduce particle generation and extend the mean time between preventive maintenance (PM).

AMAT 0200-20055

Product Name: RF Impedance Matching Network Assembly for Endura PVD Systems Product Introduction: This component is a sophisticated RF matching network specifically engineered for the Applied Materials Endura series of Physical Vapor Deposition (PVD) tools. It acts as the critical interface between the RF power generator and the plasma processing chamber. Its primary function is to ensure maximum power transfer efficiency by dynamically adjusting the impedance to match the complex load presented by the plasma, which fluctuates significantly during ignition, steady-state processing, and plasma extinction. This unit is essential for maintaining process stability, minimizing reflected power that can damage expensive generators, and ensuring film uniformity across the wafer surface.

AMAT 0140-12305

Product Name: Wafer Clamping Ring Assembly Product Introduction: A precision-machined component used to secure the wafer firmly against the electrostatic chuck (ESC) during high-temperature and high-stress processing. It ensures excellent thermal transfer and prevents wafer edge lifting during plasma bombardment. Technical Specifications:

  • Material: Single-crystal Silicon Carbide (SiC) or Yttrium-coated Aluminum
  • Diameter: Configured for 200mm (300mm equivalent available) standard wafer sizes

AMAT 0150-14869

Product Name: Chamber Liner Kit for PVD Impulse Systems Product Introduction: This is a consumable chamber liner kit specifically engineered for the Impulse PVD platform. It acts as a sacrificial shield to protect the main chamber walls from sputtering deposition, particle generation, and chemical corrosion during the physical vapor deposition process. Technical Specifications:

  • Material: High-purity Aluminum (Al) or Aluminum-Magnesium alloy (for specific barrier layers)
  • Dimensions: Custom fit for 200mm and 300mm wafer processing chambers

AMAT 0200-20055

Product Name: Advanced RF Match Network Assembly for Endura Platforms Product Introduction: This component is a critical RF matching network designed for Applied Materials' Endura series physical vapor deposition (PVD) systems. It serves to maximize power transfer between the RF generator and the plasma chamber, ensuring stable plasma ignition and maintenance during high-power sputtering processes. Technical Specifications:

  • Frequency Range: 13.56 MHz (Standard Industrial Band)

AMAT 0040-01239

Product Name: Electrostatic Chuck (ESC) for Etch/Deposition Systems Product Introduction: The 0040-01239 is an Electrostatic Chuck (ESC) assembly used in various Applied Materials process modules (both etch and deposition). The ESC is the platform on which the wafer sits inside the vacuum chamber. It uses electrostatic force (Coulomb or Johnsen-Rahbek effect) to hold the wafer firmly in place, even under high vacuum and during plasma bombardment. It also typically incorporates a helium backside cooling system to control wafer temperature. Technical Specifications:

  • System Compatibility: Multi-chamber platforms (e.g., DPS, Eterna)

AMAT 0010-10901

Product Name: 300mm Endura Volta HD+ PVD Chamber Component Kit (Collimator/Shield) Product Introduction: This kit is a major maintenance hardware set for the Applied Materials Endura Volta HD+ PVD system. It is designed to refresh the internal chamber environment to "like-new" condition. The Volta HD+ is a high-density plasma source used for filling small features with copper. The kit typically includes the collimator, chamber liners, and various shields that have been eroded by the intense plasma bombardment over thousands of wafers. Technical Specifications:

  • System Compatibility: Endura Volta HD+ (300mm)

AMAT 0010-29083

Product Name: Endura Cirrus PVD Chamber Liner Kit Product Introduction: The 0010-29083 is a comprehensive chamber liner and shield kit for the Applied Materials Endura Cirrus PVD system. The Cirrus platform is specialized for Ionized Metal Plasma (IMP) deposition, which is essential for sub-quarter-micron metallization. This kit includes the chamber walls, bottom shields, and target shields that protect the main chamber from sputter coating and plasma erosion. These liners are sacrificial components replaced periodically during preventive maintenance. Technical Specifications:

  • System Compatibility: Applied Materials Endura Cirrus PVD

AMAT 4020-00084

Product Name: DPS II RF Match Network for Etch Systems Product Introduction: This is an RF Match Network specifically designed for the Applied Materials Decoupled Plasma Source (DPS) II etch systems, such as the Flex or Kiyo platforms. In plasma etching, maintaining a stable plasma is crucial for anisotropic etching profiles. The match network sits between the RF generator and the plasma source coil (antenna). It matches the impedance of the generator (typically 50 ohms) to the impedance of the plasma load, which varies dynamically during the etch process. Technical Specifications:

  • System Compatibility: Applied Materials DPS II Etch Modules (e.g., Flex, Kiyo)

AMAT 0190-53515

Product Name: PVD Focusing Ring Assembly Product Introduction: The 0190-53515 is a consumable hardware component used in Applied Materials PVD chambers (such as the Endura series). It is a ring-shaped structure, typically made of aluminum or a dielectric material, placed around the edge of the wafer or inside the chamber near the target. Its primary function is to shape the plasma density profile and control the electric field lines at the wafer edge, preventing the "edge effect" where deposition rates and film properties differ at the wafer periphery. Technical Specifications:

  • System Compatibility: Various Applied Materials PVD Systems (Endura, SIP)

AMAT 0150-76175

Product Name: Endura Impulse PVD Collimator/Target Assembly Component Product Introduction: This part number refers to a specific component within the Endura Impulse PVD system, typically associated with the collimator or the target assembly. The Impulse system is designed for Ionized Metal Plasma (IMP) deposition, which provides superior bottom and sidewall coverage compared to traditional sputtering. The collimator is a honeycomb-like structure that filters out neutral atoms, allowing only ionized metal atoms to reach the wafer at a specific angle. Technical Specifications:

  • System Compatibility: Applied Materials Endura Impulse PVD

AMAT 0020-22801

Product Name: Producer GT CVD Precursor Gas Distribution Manifold Product Introduction: The 0020-22801 is a specialized gas delivery manifold designed for the Applied Materials Producer GT CVD system. This system is often used for high-throughput dielectric deposition. The manifold distributes reactive gases evenly across the 300mm wafer surface. It is a critical component for controlling film uniformity, deposition rate, and film quality. The internal flow paths are engineered to handle aggressive chemistries without corroding or generating particles. Technical Specifications:

  • Equipment Match: Applied Materials Producer GT CVD Chamber