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AMAT 0020-26313

Product Name: 50 Ohm Coaxial RF Power Cable Assembly

Product Introduction:
This is a high-power transmission line assembly designed to carry RF energy from the matching network or generator to the plasma coil or electrode within the process chamber. It must handle high voltages and currents while minimizing signal loss (attenuation) and reflection. The cable is engineered for flexibility to accommodate moving parts (like lift pins) while maintaining electrical integrity in a harsh environment with RF fields and magnetic interference.

Technical Specifications:

  • Impedance: 50 Ohms (Nominal), strictly controlled to maintain VSWR < 1.2:1
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Detailed content

  • Frequency Range: DC to 100 MHz (covering 13.56 MHz and harmonics)
  • Power Handling: Capable of continuous power up to 3000 Watts (depending on length and cooling)
  • Voltage Rating: Up to 1500 Volts RMS
  • Attenuation: Typically < 0.1 dB per meter at 13.56 MHz
  • Shielding: Double or triple-layer shielding (braid + foil) to prevent RF leakage and external interference.
  • Jacket Material: Low-outgassing, flame-retardant material (e.g., FEP or PFA Teflon).
  • Connectors: High-power RF connectors (7/16 DIN, N-Type, or Type-N) with silver plating.

Functional Features:

  • Water Cooling: Many assemblies include an inner conductor with a hollow core or an outer cooling jacket to circulate chilled water for high-power applications.
  • Flex Life: Rated for millions of flex cycles if used on moving stages (e.g., robot arms or lift pins).
  • Phase Stability: Designed to maintain a stable electrical length (phase) to ensure consistent power delivery, critical for multi-coil systems.
  • Arc Resistance: Insulation materials are chosen to resist tracking and arcing in high-voltage environments.
  • Low VSWR: Precision manufacturing ensures minimal impedance mismatches at connector interfaces.

Application Scenarios:

  • ICP (Inductively Coupled Plasma) Sources: Connecting the RF generator to the inductive coil antenna surrounding the chamber.
  • CCP (Capacitively Coupled Plasma) Electrodes: Delivering power to the showerhead or pedestal electrode.
  • Plasma Immersion Ion Implantation (PIII): Connecting the high-voltage pulser to the chamber grid.
  • Test and Measurement: Used in RF diagnostic setups to sample forward and reflected power.

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