AMAT 0040-75717
Product Name: CMP Head Membrane / Diaphragm
Product Description: A flexible, elastomeric membrane for the CMP polishing head. It provides uniform pneumatic pressure distribution across the back of the wafer to ensure planar polishing.
Technical Specifications:
- Material: High-grade, chemically resistant elastomer (e.g., EPDM, Neoprene, or FFKM).










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