AMAT 0040-50608
- Product Name: Liner, Upper Chamber
- Product Description: A high-performance protective liner for the upper region of semiconductor processing chambers.
- Technical Specifications:
- Material: High-purity quartz (SiO₂)
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AMAT 0040-32136
- Product Name: Chamber Body, ASP+
- Product Description: Advanced chamber body designed for the ASP+ (Advanced Source Processing) platform in semiconductor manufacturing.
- Technical Specifications:
- Material: Forged and heat-treated aluminum alloy
AMAT 0040-09557
- Product Name: Chamber Body, 200mm CVD
- Product Description: Main structural chamber body component for 200mm chemical vapor deposition (CVD) systems.
- Technical Specifications:
- Material: Solid 6061-T6 aluminum alloy
AMAT 0040-03578
- Product Name: Faceplate, Showerhead
- Product Description: A precision-engineered showerhead faceplate for uniform gas distribution in semiconductor deposition processes.
- Technical Specifications:
- Material: High-purity aluminum alloy
AMAT 0021-11297
- Product Name: Assembly, Heater Jacket
- Product Description: An insulated heating assembly designed to maintain precise temperatures on chamber components in semiconductor processing equipment.
- Technical Specifications:
- Heating Element: Nichrome resistance wire with high-temperature insulation
AMAT 0020-34140
- Product Name: Support, Pedestal Lift
- Product Description: A structural support component for wafer pedestal lift mechanisms in semiconductor processing chambers.
- Technical Specifications:
- Material: Stainless steel 17-4PH, H900 condition
AMAT 0020-30723
- Product Name: Cylinder, Clamping Aluminum 200mm Notch
- Product Description: A precision-machined aluminum clamping cylinder designed for securing wafer components in 200mm semiconductor processing equipment.
- Technical Specifications:
- Material: High-strength aluminum alloy 7075-T6
AMAT 0020-26578
- Product Name: Clamp Ring, Chamber Liner
- Product Description: A robust mechanical clamping ring designed to secure chamber liners and shields in high-vacuum semiconductor processing environments.
- Technical Specifications:
- Material: Anodized aluminum alloy 6061-T6
AMAT 0020-25731
- Product Name: Shield, Gas Distribution
- Product Description: A precision-engineered metallic shield component for controlling and directing gas flow within semiconductor process chambers.
- Technical Specifications:
- Material: High-grade 316L stainless steel
AMAT 0020-20580
- Product Name: Insulator, DC Bias
- Product Description: A high-performance ceramic insulator designed for electrical isolation in DC bias applications within semiconductor processing chambers.
- Technical Specifications:
- Material: High-purity alumina ceramic
AMAT 0190-48891
- Product Name: Double-Filament Hot Cathode Ion Gauge
- Product Description: A high-reliability hot cathode ionization gauge for precise measurement of high and ultra-high vacuum (UHV) pressures.
- Technical Specifications:
- Measurement Range: 1 x 10⁻¹⁰ Torr to 1 x 10⁻³ Torr.
AMAT 0010-03171
- Product Name: Quartz Gas Distribution Showerhead
- Product Description: A high-purity fused quartz showerhead for uniform radial distribution of process gases into semiconductor deposition chambers.
- Technical Specifications:
- Material: High-purity fused silica (quartz, >99.99% SiO₂).