Digital guide
You are here:
AMAT 0200-09835
- Product Name: Pin, Lift, Sapphire
- Product Description: High-performance sapphire lift pin for wafer support and elevation in high-temperature semiconductor process chambers.
- Technical Specifications:
- Material: High-purity single-crystal sapphire (Al₂O₃, 99.999% purity)
Detailed content
-
- Diameter: 3.0mm ±0.005mm
- Length: 75.0mm ±0.02mm
- Surface Finish: Polished to mirror finish (Ra ≤ 0.05μm)
- Temperature Resistance: Up to 2,000°C continuous
- Hardness: 2200 Knoop (second only to diamond)
- Functional Features:
- Exceptional wear resistance for extended service life
- Non-porous surface prevents particle generation
- Chemical inertness to all process gases and plasmas
- Low thermal conductivity minimizes heat transfer
- No contamination risk to wafers or process environments
- Application Scenarios:
- Used in AMAT Endura PVD chambers
- Applied in high-temperature epitaxial processes
- Deployed in wafer lift systems for 200mm and 300mm wafers
- Utilized in processes requiring ultra-high purity materials
- Suitable for metal and dielectric deposition applications
