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AMAT 0020-27383

  • Product Name: Ring, Focus, Silicon
  • Product Description: High-purity single-crystal silicon focus ring for plasma confinement and uniform processing in semiconductor etch applications.
  • Technical Specifications:
    • Material: N-type single-crystal silicon (100 orientation)
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Detailed content

    • Outer Diameter: 340mm
    • Inner Diameter: 305mm
    • Thickness: 12.0mm ±0.05mm
    • Resistivity: 1-5 ohm-cm
    • Surface Finish: Double-side polished (Ra ≤ 0.03μm)
  • Functional Features:
    • Precision machined for optimal plasma focusing
    • Matches thermal expansion characteristics of silicon wafers
    • High purity prevents metallic contamination
    • Uniform electrical conductivity ensures consistent plasma properties
    • Low defect structure minimizes particle generation
  • Application Scenarios:
    • Used in AMAT Centura etch systems
    • Applied in dielectric and poly-silicon etch processes
    • Deployed in 200mm wafer manufacturing environments
    • Utilized in gate etch and contact etch applications
    • Suitable for advanced semiconductor device fabrication

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