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AMAT 0020-79705
- Product Name: Shield, Upper Chamber, Quartz
- Product Description: High-purity quartz protective shield for upper chamber regions in plasma-based semiconductor processing equipment.
- Technical Specifications:
- Material: High-purity fused silica (quartz) with <1ppm metallic impurities
Detailed content
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- Wall Thickness: 5.0mm ±0.1mm
- Diameter: 410mm (for 300mm chamber compatibility)
- Temperature Gradient Resistance: >150°C/sec thermal shock resistance
- Optical Transparency: >90% transmission at 193nm wavelength
- Functional Features:
- Excellent resistance to fluorine and chlorine plasma chemistries
- High thermal shock resistance for rapid thermal cycling
- Non-porous structure prevents particle entrapment
- Transparent to process monitoring radiation
- Easy to clean and replace during maintenance cycles
- Application Scenarios:
- Used in AMAT DPS II and eMax etch chambers
- Applied in high-density plasma dielectric etch processes
- Deployed in 300mm wafer manufacturing environments
- Utilized in advanced node semiconductor fabrication (≤7nm)
- Suitable for processes requiring high chemical purity
