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AMAT 0040-97734

  • Product Name: Electrostatic Chuck (ESC), Ceramic
  • Product Description: Advanced ceramic electrostatic chuck for wafer clamping and temperature control in plasma etch and deposition processes.
  • Technical Specifications:
    • Material: High-purity aluminum nitride (AlN) ceramic

AMAT 0200-10284

  • Product Name: Lift Pin, Ceramic
  • Product Description: High-purity ceramic lift pin designed for wafer support and positioning in high-temperature semiconductor process chambers.
  • Technical Specifications:
    • Material: High-purity alumina ceramic (Al₂O₃, 99.8% purity)

AMAT 0020-31638

  • Product Name: Insulator, DC Bias, Ceramic
  • Product Description: Advanced high-performance ceramic insulator for DC bias applications in high-power semiconductor process chambers.
  • Technical Specifications:
    • Material: High-purity alumina-zirconia composite ceramic

AMAT 0020-27383

  • Product Name: Ring, Focus, Silicon
  • Product Description: High-purity single-crystal silicon focus ring for plasma confinement and uniform processing in semiconductor etch applications.
  • Technical Specifications:
    • Material: N-type single-crystal silicon (100 orientation)

AMAT 0040-62413

  • Product Name: Liner, Lower Chamber, Silicon Carbide (SiC)
  • Product Description: High-performance silicon carbide liner for lower chamber regions requiring extreme wear and chemical resistance in semiconductor processing.
  • Technical Specifications:
    • Material: Sintered alpha-phase silicon carbide (SiC)

AMAT 0200-09244

  • Product Name: Shaft, Pedestal Lift, Ceramic Coated
  • Product Description: Precision linear drive shaft for wafer pedestal elevation systems, featuring advanced ceramic coating for wear resistance in vacuum environments.
  • Technical Specifications:
    • Base Material: 17-4PH stainless steel (H900 condition)

AMAT 0020-79705

  • Product Name: Shield, Upper Chamber, Quartz
  • Product Description: High-purity quartz protective shield for upper chamber regions in plasma-based semiconductor processing equipment.
  • Technical Specifications:
    • Material: High-purity fused silica (quartz) with <1ppm metallic impurities

AMAT 3300-04424

  • Product Name: Fitting, Male Connector, 1/4" VCR - 8mm Tube
  • Product Description: Precision metal face-seal fitting for reliable connections in high-purity gas delivery systems of semiconductor manufacturing.
  • Technical Specifications:
    • Material: 316L VAR (Vacuum Arc Remelted) stainless steel

AMAT 0200-09835

  • Product Name: Pin, Lift, Sapphire
  • Product Description: High-performance sapphire lift pin for wafer support and elevation in high-temperature semiconductor process chambers.
  • Technical Specifications:
    • Material: High-purity single-crystal sapphire (Al₂O₃, 99.999% purity)

AMAT 0040-99333

  • Product Name: Adaptor, Chamber Component Mounting
  • Product Description: Precision-engineered mechanical adapter for secure mounting and alignment of critical components within semiconductor process chambers.
  • Technical Specifications:
    • Material: 316L stainless steel with electropolished finish

AMAT 0140-12997

  • Product Name: Harness Assembly, RF Chamber Interlock
  • Product Description: Specialized cable assembly for RF chamber safety interlock systems, providing critical monitoring and control in high-power radio frequency environments.
  • Technical Specifications:
    • Conductor: 18 AWG stranded tinned copper

AMAT 0140-09986

  • Product Name: Harness Assembly, System Control Power Distribution
  • Product Description: A pre-configured electrical wiring harness designed for reliable power distribution and control signal transmission within semiconductor manufacturing equipment.
  • Technical Specifications:
    • Conductor Material: High-purity oxygen-free copper