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AMAT 0051-01978

Product Name: Endura Vacuum Lock Valve Pneumatic Actuator Assembly Product Introduction: This component is a high-vacuum isolation valve actuator assembly used primarily in Applied Materials Endura PVD and CVD systems. It serves as the gatekeeper between the central transfer chamber (maintained at high vacuum) and the process modules or load locks. The actuator provides the mechanical force to open or close the valve gate, ensuring that the vacuum integrity of the system is maintained during wafer transfer and processing. Technical Specifications:

  • System Compatibility: Applied Materials Endura Series (Centura and Integrated Platforms)

AMAT 3870-01300

Product Name: Producer XP CVD Showerhead Gas Injection Assembly Product Introduction: The 3870-01300 is a precision-engineered gas distribution manifold, commonly referred to as a "showerhead," used in the Applied Materials Producer XP Chemical Vapor Deposition (CVD) system. It is responsible for introducing precursor gases (such as silane, ammonia, or TEOS) into the process chamber in a highly uniform manner. The design ensures that gas flows laminarly across the wafer surface, which is essential for achieving uniform film thickness, stoichiometry, and step coverage. Technical Specifications:

  • Equipment Match: Applied Materials Producer XP CVD Chamber

AMAT 9090-00115

Product Name: Endura Volta HD+ Source RF Match Network Assembly Product Introduction: This assembly is a critical radio frequency (RF) impedance matching unit designed specifically for the Applied Materials Endura Volta HD+ Physical Vapor Deposition (PVD) system. It is engineered to maximize power transfer from the RF generator to the plasma source within the sputtering chamber. By dynamically adjusting capacitance and inductance, it ensures that the plasma ignites and sustains efficiently, minimizing reflected power which can damage sensitive RF components. This unit is integral to high-density plasma (HDP) processes used in advanced copper metallization. Technical Specifications:

  • System Compatibility: Applied Materials Endura Volta HD+ PVD Cluster Tool

AMAT 0020-22801

Product Introduction: This part is a critical gas delivery component for the Applied Materials Producer GT CVD system, used primarily for dielectric deposition. The manifold ensures uniform distribution of precursor gases across the surface of the wafer to achieve consistent film thickness and stoichiometry. Technical Specifications:

  • Equipment Match: Producer GT CVD Chamber
  • Function: Gas Injection and Distribution

AMAT 0010-29083

Product Introduction: The 0010-29083 is a chamber hardware kit for the Applied Materials Endura Cirrus PVD platform. The Cirrus system is renowned for its capability in ionized metal plasma (IMP) deposition, particularly for barrier and seed layers. This assembly protects the chamber walls from sputter coating and plasma erosion. Technical Specifications:

  • System Compatibility: Endura Cirrus PVD System
  • Material Composition: Titanium or Tantalum coated stainless steel (for shields), Aluminum (for liners)

AMAT 0010-10901

Product Introduction: This component kit is specifically designed for the Applied Materials Endura Volta HD+ Physical Vapor Deposition (PVD) system. It serves as a critical maintenance and upgrade kit to ensure chamber stability during high-density plasma sputtering processes. The kit typically includes wear-resistant shields, collimators, and chamber liners optimized for copper and aluminum metallization. Technical Specifications:

  • Compatibility: Endura Volta HD+ PVD Cluster Tool
  • Wafer Size: 300mm (12-inch)

AMAT 0150-04723

Product Description: A high-performance printed circuit board designed to condition and convert analog sensor signals for process monitoring and control in Applied Materials' semiconductor manufacturing systems. Provides reliable signal conversion between various sensor types and the main system controller.
Technical Specifications:
  • Analog Inputs: 16 differential analog input channels
  • Input Ranges: 0–10V, 4–20mA, and ±5V selectable per channel

AMAT 0021-42306

Product Description: A precision-machined component designed to safely lift and position semiconductor wafers within processing chambers. Features advanced materials and design to minimize contamination risk while providing reliable wafer handling in high-vacuum environments.
Technical Specifications:
  • Material: High-purity ceramic (alumina) with stainless steel base
  • Length: 150mm total length

AMAT 0040-20124 Ceramic Heater Pedestal Assembly

Product Description: A high-performance heating component designed for precise wafer temperature control in semiconductor processing chambers. Features advanced ceramic construction for excellent thermal uniformity and electrical isolation, critical for consistent thin-film deposition results.
Technical Specifications:
  • Wafer Compatibility: 200mm (8-inch) semiconductor wafers
  • Heating Element: Multi-zone embedded resistance heating elements

AMAT 0020-78186 Chamber Liner Shield Assembly

Product Description: A protective component designed to shield critical chamber components from process byproducts and plasma damage in semiconductor etching and deposition systems. Extends chamber maintenance intervals and improves process consistency by containing process contaminants.
Technical Specifications:
  • Material: High-purity 316L stainless steel with yttria coating
  • Coating Thickness: 200μm uniform protective coating

AMAT 3300-07824 Graphite Gasket Seal Assembly

Product Description: A high-temperature sealing component manufactured from premium-grade graphite material, designed for reliable sealing in extreme temperature semiconductor processing applications. Provides excellent thermal stability and chemical resistance in demanding process environments.
Technical Specifications:
  • Material: High-purity flexible graphite foil (99.9% carbon content)
  • Construction: Multi-layer laminated graphite with stainless steel insert

AMAT 0020-21104 Wafer Centering Ring Assembly

Product Description: A precision-machined component designed to accurately center semiconductor wafers within processing chambers, ensuring uniform process results across the entire wafer surface. Critical for maintaining process consistency in both 200mm and 300mm wafer manufacturing environments.
Technical Specifications:
  • Wafer Compatibility: 200mm (8-inch) and 300mm (12-inch) semiconductor wafers
  • Material: High-purity aluminum with hard anodized coating