Digital guide
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AMAT 0020-22801
Product Introduction: This part is a critical gas delivery component for the Applied Materials Producer GT CVD system, used primarily for dielectric deposition. The manifold ensures uniform distribution of precursor gases across the surface of the wafer to achieve consistent film thickness and stoichiometry.
Technical Specifications:
- Equipment Match: Producer GT CVD Chamber
- Function: Gas Injection and Distribution
Detailed content
- Materials: Stainless Steel 316L EP (Electropolished) or Hastelloy for corrosive chemistries.
- Port Configuration: Multi-zone gas injection with showerhead design.1.
- Operating Pressure: Atmospheric to Low Pressure (LP-CVD) ranges.
Functional Features: - Uniform Flow Dynamics: Computational Fluid Dynamics (CFD) optimized channel design to eliminate dead zones and ensure laminar flow.
- Corrosion Resistance: Passivated internal surfaces to prevent particle generation from chemical reactions with precursors like TEOS or Silane.
- Temperature Control: Integrated heating elements or proximity to lamps for thermal CVD processes
