Digital guide
You are here:
AMAT 0021-42306
Product Description: A precision-machined component designed to safely lift and position semiconductor wafers within processing chambers. Features advanced materials and design to minimize contamination risk while providing reliable wafer handling in high-vacuum environments.
Technical Specifications:
- Material: High-purity ceramic (alumina) with stainless steel base
- Length: 150mm total length
Detailed content
- Diameter: 6mm shaft diameter with 10mm contact tip
- Surface Finish: Polished to Ra < 0.4μm for minimal particle generation
- Temperature Resistance: -40°C to +300°C continuous operation
- Load Capacity: 500g maximum wafer weight
- Mounting: Threaded base (M6) for secure installation
- Weight: 0.12kg per pin
Functional Features:
- Non-contaminating ceramic construction for ultra-clean environments
- Smooth, low-friction operation preventing wafer damage
- Chemical resistance to all semiconductor process chemicals
- Minimal contact area with wafer reducing contamination risk
- Easy installation and replacement without chamber venting
- Long service life with minimal maintenance requirements
- Compatibility with standard AMAT wafer handling systems
Application Scenarios:
- Wafer lifting in deposition chambers
- Etch process wafer positioning
- Thermal processing equipment wafer support
- Wafer handling system lift mechanisms
- Vacuum chamber wafer transfer
- Process development wafer positioning
