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AMAT 3870-01300
Product Name: Producer XP CVD Showerhead Gas Injection Assembly
Product Introduction: The 3870-01300 is a precision-engineered gas distribution manifold, commonly referred to as a “showerhead,” used in the Applied Materials Producer XP Chemical Vapor Deposition (CVD) system. It is responsible for introducing precursor gases (such as silane, ammonia, or TEOS) into the process chamber in a highly uniform manner. The design ensures that gas flows laminarly across the wafer surface, which is essential for achieving uniform film thickness, stoichiometry, and step coverage.
Technical Specifications:
- Equipment Match: Applied Materials Producer XP CVD Chamber
Detailed content
- Material: Stainless Steel 316L EP (Electropolished) or specialized alloys (Hastelloy) for corrosive resistance
- Design: Multi-zone injection with hundreds of precisely drilled micro-holes
- Operating Temperature: Capable of withstanding temperatures up to 600°C – 800°C
- Pressure Rating: Designed for Low Pressure CVD (LPCVD) or Atmospheric Pressure CVD (APCVD) regimes
Functional Features: - Laminar Flow Control: The hole pattern is optimized using Computational Fluid Dynamics (CFD) to prevent turbulence and ensure uniform gas concentration at the wafer surface.
- Particle Suppression: Electropolished internal surfaces reduce the risk of particle generation caused by gas reactions or flaking.
- Thermal Uniformity: Often integrated with heating elements or designed to work in conjunction with external lamps to prevent gas condensation and ensure consistent reaction kinetics.
- Easy Cleaning: Designed for in-situ cleaning (dry clean or wet clean) to remove deposition buildup without damaging the micro-holes.
Application Scenarios: - Deposition of silicon dioxide (SiO2) and silicon nitride (Si3N4) dielectric layers.
- Polysilicon deposition for gate electrodes or word lines in memory devices.
- Tungsten (W) deposition for contact fills and local interconnects.
- Processes requiring strict control over film stress and refractive index.
