AMAT 0240-20067 Ceramic Heater Assembly
Product Overview: The AMAT 0240-20067 is a high-performance ceramic heater assembly designed for use in Applied Materials semiconductor processing equipment. It provides precise, uniform heating for process chambers, wafers, and other critical components, ensuring optimal temperature conditions for semiconductor manufacturing processes such as CVD, PVD, and thermal annealing. This heater assembly is engineered with high-purity ceramic materials and advanced heating elements, offering exceptional thermal stability, uniform heat distribution, and resistance to plasma and chemical attack. It is a critical component for maintaining process consistency and wafer quality.
Technical Specifications:
- Material Composition: Heater core made of high-purity alumina (Al₂O₃) ceramic (99.99% purity), with a tungsten heating element embedded within the ceramic.
- Dimensions: Diameter 300mm, thickness 15mm, designed for 300mm wafer processing.
- Temperature Range: Operating temperature: 0-800°C, with a maximum temperature of 1000°C for short-term operation.











