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AMAT 0200-10163 SiN Isolator for Enhanced Pumping Lid
Product Overview: The AMAT 0200-10163 is a silicon nitride (SiN) isolator designed specifically for the enhanced pumping lid (DXZ) of Applied Materials semiconductor processing equipment. It serves as an electrical insulator and thermal barrier, ensuring the safe and efficient operation of the pumping lid system. This isolator is manufactured from high-purity SiN ceramic, offering exceptional electrical insulation, high-temperature resistance, and plasma erosion resistance. It is a critical component for maintaining the integrity of the enhanced pumping lid, enabling efficient vacuum pumping and process control.
Technical Specifications: – Material Composition: High-purity silicon nitride (SiN) ceramic with a purity of 99.9%, offering excellent mechanical strength and thermal stability. – Dimensions: Outer diameter 120mm, inner diameter 100mm, thickness 8mm, with a surface roughness ≤ 0.2 μm.
Detailed content
– Electrical Insulation: Volume resistivity ≥ 1×10¹⁴ Ω·cm at 25°C, ensuring effective electrical isolation. – Temperature Resistance: Maximum continuous operating temperature of 1300°C, with short-term resistance up to 1500°C. – Thermal Conductivity: 80 W/m·K, providing effective thermal insulation and heat dissipation. – Plasma Resistance: Resistant to erosion from plasma (CF₄, Cl₂, Ar) and process gases, minimizing material loss. – Dimensional Tolerance: ±0.01mm, ensuring precise fit with the enhanced pumping lid (DXZ) assembly. – Certification: Complies with SEMI F17 standards for ceramic components and ISO 9001 quality control requirements.
Functional Features: – Provides effective electrical insulation for the enhanced pumping lid (DXZ), preventing electrical arcing and equipment damage. – Acts as a thermal barrier, reducing heat transfer between the pumping lid and other equipment components. – Resists plasma erosion and chemical attack, extending the isolator’s service life and reducing maintenance frequency. – Maintains structural integrity at high temperatures and under vacuum conditions, ensuring long-term reliability. – Enables efficient vacuum pumping by maintaining the integrity of the pumping lid seal, ensuring optimal vacuum levels. – Minimizes particle generation, with a smooth surface that prevents dust accumulation and contamination. – Integrates seamlessly with AMAT’s DXZ enhanced pumping lid assembly, ensuring easy installation and replacement.
Application Scenarios: – Installed in AMAT’s DXZ enhanced pumping lid assemblies for Centura and Endura series equipment. – Used in plasma etching, CVD, and PVD systems requiring efficient vacuum pumping. – Applied in 200mm and 300mm wafer manufacturing processes, including advanced technology nodes. – Suitable for semiconductor fabs with strict vacuum and process control requirements. – Ideal for high-volume production lines, where equipment uptime and pumping efficiency are critical. – Used in research and development facilities for advanced vacuum system testing and optimization.
