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AMAT 0020-78186 Chamber Liner Shield Assembly
Product Description: A protective component designed to shield critical chamber components from process byproducts and plasma damage in semiconductor etching and deposition systems. Extends chamber maintenance intervals and improves process consistency by containing process contaminants.
Technical Specifications:
- Material: High-purity 316L stainless steel with yttria coating
- Coating Thickness: 200μm uniform protective coating
Detailed content
- Dimensions: Precision-machined to fit 300mm process chambers
- Surface Finish: Electropolished internal surfaces (Ra < 0.5μm)
- Temperature Resistance: -40°C to +350°C continuous operation
- Mounting: Snap-fit design with alignment features
- Weight: 1.8kg
Functional Features:
- Excellent resistance to plasma erosion and chemical attack
- Low particle generation maintaining ultra-clean process environment
- Easy installation and removal for chamber maintenance
- Reusable design with multiple cleaning cycles possible
- Effective containment of process byproducts reducing chamber contamination
- Compatibility with standard AMAT chamber designs
- Improved process uniformity across wafer surface
Application Scenarios:
- Plasma etching chamber component protection
- Chemical vapor deposition (CVD) chamber shielding
- Physical vapor deposition (PVD) chamber liner protection
- High-volume production chamber maintenance extension
- Process development chamber protection
- Etch process byproduct containment
