Digital guide
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AMAT 0010-30904
Product Name: Mass Flow Controller (MFC) – Gas Line
Product Introduction: A device used to measure and control the flow rate of a specific process gas entering the chamber with high precision. It is essential for repeatable process recipes.
Technical Specifications:
- Gas Compatibility: Corrosive (Cl2, HBr, WF6) or Non-corrosive (Ar, N2, O2).
- Flow Range: 10 sccm to 5000 sccm (standard cubic centimeters per minute).
Detailed content
- Accuracy: ±1% of reading or ±0.5% of full scale (whichever is greater).
- Repeatability: ±0.25% of full scale.
- Response Time: < 100ms (95% of setpoint).
- Pressure Drop: Minimal drop to maintain upstream stability.
- Communication: Analog (0-5V) or Digital (RS-485, DeviceNet).
Functional Features: - Thermal Sensor: Uses thermal mass flow measurement principle (bypass or inline).
- Control Valve: Integrated proportional control valve for closed-loop feedback.
- On-board Diagnostics: Monitors health, leak status, and calibration validity.
- Multi-Gas Capability: Some models can be programmed for different gases with different K-factors.
Application Scenarios: - Etch Chemistry Control: Precisely meters etchant gases to control etch rate and profile.
- Deposition Stoichiometry: Controls the ratio of precursor gases in CVD/ALD processes.
- Plasma Stabilization: Provides a stable gas flow to maintain consistent plasma density.
