AMAT 0040-03508
Product Name: RF Match Network (Impedance Match)
Product Introduction: An impedance matching network situated between the RF Generator and the Plasma Chamber. Its purpose is to maximize power transfer by matching the 50-ohm output of the generator to the varying impedance of the plasma load.
Technical Specifications:
- Frequency: 13.56 MHz (fixed or tunable).
- Power Handling: 1000W to 10kW.
Detailed content
- Capacitance Range: 10pF to 2000pF (variable).
- Inductance Range: Fixed or switched (0.1uH to 5uH).
- Tuning Time: < 100ms (full tune).
- Voltage Rating: Up to 3kV peak.
Functional Features: - Automatic Tuning: Motorized capacitors and inductors controlled by a feedback loop detecting reflected power.
- Stub Tuner: Some models use a sliding shorting stub (slug tuner) for coarse tuning.
- Bypass Circuit: Allows forward power to pass even if tuning fails (at the cost of reflected power).
- Water Cooling: Liquid cooling required for high power applications.
Application Scenarios: - Plasma Ignition: Tunes the circuit to ignite the plasma with minimal reflected power.
- Process Stability: Continuously adjusts to maintain a match as the plasma impedance changes during processing (e.g., during etching of different materials).
- Generator Protection: Prevents reflected power from damaging the expensive RF Generator.





.jpg)

.jpg)


.jpg)
