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AMAT 0224-43065

Product Name: Quartz Gas Distribution Showerhead
Product Description: A high-purity fused quartz component with precision-drilled orifices, designed for uniform distribution of process gases across the wafer surface in semiconductor deposition chambers.
Technical Specifications:
  • Material: Synthetic fused silica (SiO₂, >99.999% purity)

AMAT 0140-15214

Product Name: High-Voltage Interlock Cable Harness
Product Description: A safety-rated cable assembly designed for transmitting critical high-voltage interlock (HVIL) signals between chamber access doors, safety relays, and main control systems.
Technical Specifications:
  • Conductors: 18 AWG stranded tinned copper (6 cores)

AMAT 0020-97794

Product Name: High-Temperature Ceramic Insulator
Product Description: A precision-machined high-purity ceramic component designed to provide electrical isolation and mechanical support for high-voltage/RF components in extreme high-temperature vacuum environments.
Technical Specifications:
  • Material: 99.9% High-purity alumina (Al₂O₃)

AMAT 0010-09301

Product Name: P5000 Throttle Valve Actuator Assembly
Product Description: A precision pneumatic actuator assembly for controlling the position of vacuum throttle valves, regulating gas flow and pressure within semiconductor process chambers.
Technical Specifications:
  • Actuator Type: Double-acting pneumatic piston

AMAT 0190-27748

Product Name: DeviceNet Network Interface Module
Product Description: A communication module that enables seamless connectivity between field devices (sensors, actuators, valves) and the main system controller via the DeviceNet industrial network protocol.
Technical Specifications:
  • Network Protocol: DeviceNet (CAN 2.0A)

AMAT 0190-26374

Product Name: Analog I/O Signal Conditioning Module
Product Description: A high-performance industrial module for conditioning, amplifying, and isolating analog sensor signals (temperature, pressure, flow) in semiconductor process control systems.
Technical Specifications:
  • Input Channels: 8 differential analog inputs

AMAT 0010-30057

Product Name: 300mm Electrostatic Chuck (ESC) Heater Assembly
Product Description: A complete integrated heater assembly for 300mm electrostatic chucks, providing uniform, precise wafer heating while maintaining electrostatic clamping capability.
Technical Specifications:
  • Wafer Compatibility: 300mm (12-inch)

AMAT 0200-03313

Product Name: 300mm Fixed-Floating Lift Ring

Product Description: A precision-engineered annular component designed for wafer lifting and positioning within 300mm semiconductor process chambers. It integrates fixed and floating mechanisms to ensure stable, non-contact wafer support during transfer and processing.

AMAT 0015-00404

Product Name: Precision Ground Stainless Steel Dowel Pin

Product Description: A precision-ground cylindrical locating pin used for accurate alignment and positioning of critical components in semiconductor equipment. It ensures repeatable, high-precision assembly of chamber modules, fixtures, and mechanical assemblies.

AMAT 0010-20389

Product Name: 200mm Heater Pedestal Assembly

Product Description: A complete heated wafer support pedestal assembly for 200mm wafer processing. It integrates a resistive heating element, temperature sensor, and mechanical support to provide precise, uniform wafer heating during thin-film deposition and etching.

AMAT 0190-01458

Product Name: Pneumatic Valve Control Module
Product Description: A digital solenoid valve controller module that manages the actuation of pneumatic valves for gas delivery, vacuum control, and process chamber automation. It provides precise, high-speed valve control with integrated diagnostics.
Technical Specifications:
  • Input Voltage: 24V DC

AMAT 0022-17726

Product Name: Quartz Process Tube Mandrel

Product Description: A high-purity fused quartz mandrel (core rod) used as a forming tool or support structure for manufacturing and servicing vertical/horizontal diffusion furnaces and process tubes. It provides dimensional stability and non-contamination during high-temperature thermal processes.