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AMAT 0100-35346 Chamber Pressure Control Valve

Product Introduction: This is a high-precision vacuum pressure regulating valve specially used for semiconductor process chambers. It can realize stable and accurate pressure control from high vacuum to atmospheric pressure, and is widely used in the pressure regulation of etching, deposition, cleaning and other process chambers. Its ultra-low leakage, fast response and high stability ensure the process repeatability and wafer consistency.
Technical Specifications:
  • Pressure Control Range: 10⁻⁶ Torr to 760 Torr, covering full vacuum to atmospheric pressure
  • Control Accuracy: ±0.1% of set value, with high precision regulation ability

AMAT 0040-89644 RF Match Network Assembly

Product Introduction: This is a high-performance automatic radio frequency impedance matching network for plasma process equipment. It can automatically adjust the impedance between the RF power supply and the plasma load in real time, minimize the reflected power, maximize the energy transfer efficiency, ensure the stable ignition and uniform distribution of plasma, and directly affect the process uniformity, repeatability and equipment stability of etching and deposition.
Technical Specifications:
  • Working Frequency: 13.56 MHz standard industrial RF frequency

AMAT 0040-21377 Wafer Handling Robot End Effector

Product Introduction: This is a high-precision wafer handling end effector, which is the core execution part of the automatic wafer transmission system. It can realize non-damage, high-speed and high-precision transmission of 200mm and 300mm wafers between different process chambers, ensuring the stability and efficiency of the whole semiconductor production line. It adopts anti-static, low-particle and high-rigidity design, which is suitable for high vacuum and ultra-clean environment.
Technical Specifications:
  • Applicable Wafer Size: 200mm and 300mm silicon wafer

AMAT 0020-54672 High-Purity Gas Purification Cartridge

Product Introduction: This is a special high-efficiency gas purification component for semiconductor manufacturing, used to remove trace impurities such as particles, moisture, oxygen and organic matter in process gas. It can provide ultra-high-purity gas output for key processes, effectively reduce wafer defects caused by gas pollution, improve device yield and reliability, and is an important guarantee for advanced semiconductor manufacturing processes such as EUV lithography and 3D NAND.
Technical Specifications:
  • Filtration Efficiency: 99.9999% for particles ≥0.003 μm, meeting the strict requirements of advanced processes

AMAT 0020-35625 Precision Gas Flow Control Module

Product Introduction: This high-precision gas flow control component is an indispensable core part in semiconductor manufacturing equipment, specially developed for ultra-clean and high-stability process gas delivery. It can achieve real-time closed-loop regulation of various process gases in complex vacuum and atmospheric environments, effectively ensuring the consistency and repeatability of key processes such as deposition, etching, and doping. It is widely used in high-end semiconductor process equipment, directly affecting wafer yield, film uniformity and device performance, and is a key component to support advanced process nodes below 10nm.
Technical Specifications:
  • Operating Pressure Range: 0.1–100 Torr, compatible with high vacuum and low vacuum environment

AMAT 0010-06825 Wafer Alignment Sensor Assembly

Product Overview: The AMAT 0010-06825 is a high-precision wafer alignment sensor assembly designed for Applied Materials semiconductor equipment. It provides real-time, non-contact wafer alignment and notch detection, ensuring precise wafer positioning within process chambers and wafer handling systems. This assembly features advanced optical sensing technology, high-speed data processing, and seamless integration with AMAT’s control systems.
Technical Specifications:
  • Sensing Technology: Laser-based optical alignment, with a 650nm red laser source.
  • Alignment Accuracy: ±0.005mm for wafer centering, ±0.01° for notch detection.

AMAT 0010-01286 Wafer Cassette Loader Assembly

Product Overview: The AMAT 0010-01286 is a precision-engineered wafer cassette loader assembly designed for Applied Materials automated wafer handling systems. It provides automated loading and unloading of wafer cassettes into equipment load locks, enabling seamless integration with fab automation systems. This assembly features a robust mechanical design, precise positioning, and compatibility with standard 200mm/300mm wafer cassettes.
Technical Specifications:
  • Cassette Compatibility: Standard 200mm (25-slot) and 300mm (25-slot) wafer cassettes.
  • Positioning Accuracy: ±0.05mm for cassette placement, repeatability ±0.02mm.

AMAT LI-9496 Wafer Level Inspection Camera Module

Product Overview: The AMAT LI-9496 is a high-resolution wafer level inspection camera module designed for Applied Materials semiconductor wafer inspection systems. It provides real-time, high-resolution imaging of wafer surfaces, detecting defects, particles, and process variations during manufacturing. This module features advanced CCD/CMOS sensor technology, high-speed data transfer, and seamless integration with AMAT’s inspection software, enabling precise wafer quality control.
Technical Specifications:
  • Sensor Type: 12-megapixel CMOS sensor, with a global shutter for high-speed imaging.
  • Resolution: 4096×3072 pixels, with a pixel size of 3.45μm.

AMAT 0020-04518/A Precision Ceramic Insulator Washer

Product Overview: The AMAT 0020-04518/A is a high-precision ceramic insulator washer designed for electrical insulation and mechanical spacing in Applied Materials semiconductor equipment. It insulates metal fasteners and components from conductive parts, preventing electrical arcing and ensuring safe operation in high-voltage, high-temperature environments. Manufactured from high-purity alumina ceramic, this washer delivers exceptional electrical insulation, thermal stability, and mechanical strength.
Technical Specifications:
  • Material: 99.99% high-purity alumina (Al₂O₃) ceramic.
  • Dimensions: Outer diameter 12mm, inner diameter 6mm, thickness 1.5mm.

AMAT 0150-04722C/A High-Flow Vacuum Valve Assembly

Product Overview: The AMAT 0150-04722C/A is a high-performance, high-flow vacuum valve assembly designed for Applied Materials semiconductor equipment vacuum systems. It provides fast, reliable control of vacuum flow in process chambers, load locks, and vacuum pumping lines, enabling rapid chamber evacuation and pressure control. This valve assembly features a pneumatic actuation, zero-leak sealing, and compatibility with ultra-high-vacuum conditions.
Technical Specifications:
  • Valve Type: Pneumatically actuated bellows-sealed gate valve, C/A configuration (closed/active).

AMAT 0020-37221 Precision Metal Shield Assembly

Product Overview: The AMAT 0020-37221 is a precision-engineered metal shield assembly designed for Applied Materials semiconductor processing equipment. It protects critical chamber components from plasma erosion, process contamination, and thermal damage, while ensuring uniform plasma distribution across the wafer surface. Manufactured from high-purity aluminum or titanium, this shield assembly delivers exceptional corrosion resistance, thermal stability, and dimensional accuracy for long-term reliability.
Technical Specifications:
  • Material: High-purity 6061-T6 aluminum or commercially pure titanium (Grade 2), customer-specified.

AMAT 0020-20726 Ceramic Wafer Support Pedestal

Product Overview: The AMAT 0020-20726 is a high-precision ceramic wafer support pedestal designed for Applied Materials semiconductor processing equipment. It provides stable, uniform support for wafers during etching, deposition, and thermal processing, ensuring consistent process conditions across the wafer surface. Manufactured from high-purity alumina ceramic, this pedestal delivers exceptional thermal stability, plasma resistance, and dimensional accuracy for advanced wafer processing.
Technical Specifications:
  • Material: 99.99% high-purity alumina (Al₂O₃) ceramic, with a porous surface for vacuum chucking.
  • Dimensions: Diameter 300mm, thickness 20mm, with precision-machined wafer locating notches.