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AMAT 0100-35346 Chamber Pressure Control Valve
Product Introduction: This is a high-precision vacuum pressure regulating valve specially used for semiconductor process chambers. It can realize stable and accurate pressure control from high vacuum to atmospheric pressure, and is widely used in the pressure regulation of etching, deposition, cleaning and other process chambers. Its ultra-low leakage, fast response and high stability ensure the process repeatability and wafer consistency.
Technical Specifications:
- Pressure Control Range: 10⁻⁶ Torr to 760 Torr, covering full vacuum to atmospheric pressure
- Control Accuracy: ±0.1% of set value, with high precision regulation ability
Detailed content
- Valve Structure: Bellows sealed pneumatic control valve, zero leakage and no lubrication
- Material: 316L stainless steel body, Inconel® bellows, corrosion resistance
- Driving Air Pressure: 60–90 psig
- Leakage Rate: <10⁻⁹ atm·cc/s He, meeting ultra-high vacuum sealing requirements
- Response Speed: <50 ms, realizing fast pressure following
Functional Features:
- Adopt PID closed-loop control, with high stability and small pressure fluctuation
- Bellows sealed structure, no particle generation, suitable for ultra-clean environment
- With manual operation function, convenient for maintenance and chamber emptying
- Good compatibility with corrosive process gas and vacuum pump system
- Support analog and digital signal control, easy to integrate with equipment control system
- Long service life, suitable for long-term continuous operation in mass production lines
Application Scenarios:
- Pressure control of etching and deposition process chambers
- Pressure regulation of wafer transmission cavity and load lock chamber
- Vacuum system of molecular pump and cryogenic pump
- Plasma cleaning and in-situ regeneration process of the chamber
- Vacuum pressure control of semiconductor R&D and mass production equipment
