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AMAT 0020-62324

Product Name: Precision Machined Structural Component
Product Description: A high-precision structural element designed for critical load-bearing and alignment functions within semiconductor processing chambers. Manufactured to ultra-tight tolerances to ensure dimensional stability under high-vacuum and thermal cycling conditions.
Technical Specifications:
  • Material: High-grade, corrosion-resistant aluminum alloy (6061-T6 / 7075-T7351)

AMAT 0020-09796

  • Product Name: Shield, Quartz, Chamber Liner
  • Product Description: High-purity fused silica quartz shield for protecting chamber walls and components from plasma exposure in semiconductor etch processes.
  • Technical Specifications:
    • Material: High-purity synthetic quartz (SiO₂, <1 ppm metallic impurities)

AMAT 0040-40145

  • Product Name: Manifold Block, Gas Distribution, Ultra-High Purity (UHP)
  • Product Description: Precision-machined stainless steel manifold for distributing ultra-high purity process gases in semiconductor gas delivery systems.
  • Technical Specifications:
    • Material: 316L VAR (Vacuum Arc Remelted) stainless steel

AMAT 0040-48767

  • Product Name: Cathode Base, Electrostatic Chuck (ESC), 300mm Ultima X
  • Product Description: Precision structural base assembly for mounting and supporting 300mm electrostatic chucks in high-density plasma etch chambers.
  • Technical Specifications:
    • Material: 6061-T6 aluminum alloy, hard-anodized coating

AMAT APDH-HB6-2

  • Product Name: Optical Sensor Assembly, Wafer Position Detection
  • Product Description: High-precision optical detection assembly for non-contact wafer position, presence, and edge sensing in semiconductor wafer handling systems.
  • Technical Specifications:
    • Sensing Technology: High-resolution infrared (IR) optical array

AMAT 0020-22584

  • Product Name: Insulator, Ceramic, DC Bias
  • Product Description: High-purity ceramic insulator engineered for electrical isolation in high-voltage DC bias circuits within semiconductor process chambers.
  • Technical Specifications:
    • Material: High-purity alumina (Al₂O₃, 99.8%)

AMAT 0040-77243

  • Product Name: Ring Assembly, Composite, Retaining
  • Product Description: High-performance composite retaining ring for wafer confinement in chemical mechanical planarization (CMP) processes.
  • Technical Specifications:
    • Material: Advanced polymer composite (PEEK with carbon fiber reinforcement)

AMAT 0040-47830

  • Product Name: Plate, Source Frame
  • Product Description: Structural support plate for mounting plasma source components in 300mm PVD process chambers.
  • Technical Specifications:
    • Material: 6061-T6 aluminum alloy
    • Dimensions: 450mm x 450mm x 12.7mm

AMAT 0150-36344

  • Product Name: Cable Assembly, EMC Compensated, Pump Control
  • Product Description: Electromagnetically compensated cable assembly for reliable control signal transmission to vacuum pumps in semiconductor systems.
  • Technical Specifications:
    • Conductor: 22 AWG stranded tinned copper

AMAT DIP-510-002

  • Product Name: Display Interface Panel, Operator Control
  • Product Description: Human-machine interface panel for local equipment operation, parameter display, and system status monitoring.
  • Technical Specifications:
    • Display Type: 5.7" monochrome LCD with backlight

AMAT 0226-45365

  • Product Name: Thermocouple Scanner, DPS3100 Series
  • Product Description: Multi-channel temperature scanning module for thermocouple signal conditioning and monitoring in semiconductor process equipment.
  • Technical Specifications:
    • Input Channels: 8 differential thermocouple inputs

AMAT 0200-09716

  • Product Name: Lift Pin, Heater, WxZ
  • Product Description: Specialized heater lift pin for wafer support with integrated thermal management in CVD process chambers.
  • Technical Specifications:
    • Material: High-purity ceramic composite