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AMAT 0200-01371

Product Name: Ceramic Membrane Electrode Assembly (200mm Dual-Cell ECP)
Product Description: A high-purity ceramic membrane component used in electrochemical plasma (ECP) processes. It acts as a dielectric barrier, facilitates uniform plasma generation, and provides electrical isolation between process electrodes.
Technical Specifications:
  • Material: 99.9% high-purity alumina (Al₂O₃) ceramic

AMAT 0021-97309

Product Name: ESC (Electrostatic Chuck) Disk Shutter Assembly

Product Description: A precision-machined aluminum shutter mechanism that physically protects the electrostatic chuck surface from contamination, plasma exposure, and physical damage during wafer exchange, idle periods, and maintenance.
Technical Specifications:
  • Material: High-purity 6061-T6 aluminum alloy

AMAT 0270-20296

Product Name: Precision Calibration & Alignment Tool Kit
Product Description: A specialized tool kit designed for the precise alignment, calibration, and maintenance of critical chamber components, such as electrostatic chucks (ESC), gas delivery nozzles, and wafer handling mechanisms. Ensures optimal equipment performance and process repeatability.
Technical Specifications:
  • Material: Hardened tool steel, anodized aluminum, and ceramic gauge pins

AMAT 0010-17814

Product Name: Multi-Zone Heater Element / Cartridge Assembly
Product Description: A high-wattage, mineral-insulated (MI) cartridge heater designed for embedded installation in wafer pedestals and heat exchangers. Provides uniform, high-power heating for semiconductor process thermal control.
Technical Specifications:
  • Element: Nickel-chromium (NiCr) resistance wire

AMAT 1400-00206

Product Name: Optical Reference Sensor / Position Detector
Product Description: A non-contact optical sensor used for precise position detection of robot blades, wafer doors, and linear stages. Provides high-resolution, repeatable position feedback for motion control systems.
Technical Specifications:
  • Type: Reflective photoelectric sensor

AMAT 0010-02258

Product Name: Heater Pedestal Base / ESC Support Assembly
Product Description: A precision-machined metal base that supports the wafer heater/ESC pedestal, provides thermal isolation, and integrates coolant passages for temperature regulation. It ensures mechanical stability and efficient heat transfer.
Technical Specifications:
  • Material: Titanium alloy or oxygen-free copper (OFC)

AMAT 0020-04257

Product Name: Wafer Lift Pin / Guide Assembly
Product Description: A precision ceramic lift pin assembly used to raise and lower wafers onto the electrostatic chuck (ESC) or heater pedestal. Provides non-contact, low-particle wafer handling during transfer cycles.
Technical Specifications:
  • Material: High-purity alumina (Al₂O₃) or silicon carbide (SiC)

AMAT 0050-08366

Product Name: High-Purity Fluid Delivery Tube / Manifold Line
Product Description: A seamless, precision-drawn stainless steel tubing assembly for ultra-high-purity (UHP) gas and liquid delivery in semiconductor process tool utility panels. Ensures contamination-free fluid transport.
Technical Specifications:
  • Material: 316L VAR (Vacuum Arc Remelted) stainless steel

AMAT 0021-04643

Product Name: Dark Space Upper Shield / Plasma Confining Ring
Product Description: A specialized upper chamber shield that defines the "dark space" region above the plasma, preventing unwanted plasma interactions with the chamber lid and upper fixtures. It stabilizes plasma geometry and improves process uniformity.
Technical Specifications:
  • Material: Ultra-high-purity aluminum alloy (6061-T6)

AMAT 0020-26173

Product Name: Gas Distribution Baffle / Plate Assembly
Product Description: A precision-perforated flow plate installed beneath the showerhead to create a uniform, laminar gas flow distribution across the wafer surface. It eliminates turbulence and ensures consistent process gas delivery.
Technical Specifications:
  • Material: High-purity, electropolished 316L stainless steel

AMAT 0020-51915

Product Name: Lower Chamber Liner / Deposition Shield
Product Description: A one-piece, cylindrical protective liner installed in the lower chamber section. It shields the chamber base and pump port from coating accumulation, ensures uniform gas flow, and simplifies maintenance by containing process residues.
Technical Specifications:
  • Material: High-purity aluminum or 316L stainless steel

AMAT 0020-57650

Product Name: Upper Chamber Shield / Focus Ring Assembly
Product Description: A high-purity, machined aluminum shield component that lines the upper region of the process chamber. It protects the chamber walls from plasma bombardment, controls plasma distribution, and minimizes deposition of process byproducts.
Technical Specifications:
  • Material: High-purity 6061-T6 aluminum alloy