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AMAT 0200-09809
Product Name: Quartz Chamber Liner / Wrap-Around Shield
Product Description: A high-purity fused quartz cylindrical liner that lines the process chamber wall. It provides a chemically inert barrier, protects the chamber from plasma damage, and maintains thermal uniformity.
Technical Specifications:
- Material: High-purity synthetic fused silica (quartz)
Detailed content
- Purity: > 99.998% SiO₂, low metallic impurities
- Dimensions: 200mm wafer chamber compatible
- Wall Thickness: 3mm (uniform)
- Temperature Rating: Up to 1200°C continuous
- Transmission: High UV/VIS transparency for process monitoring
- Surface: Fire-polished & acid-etched for low particle adhesion
Key Features:
- Inert to all fluorine and chlorine-based plasmas
- Zero contamination or outgassing in UHV environments
- Excellent thermal stability minimizes thermal gradients
- Transparent design allows in-situ optical process monitoring
- High resistance to thermal shock and cracking
Application Scenarios:
Used in AMAT Centura dielectric etch, PECVD, and photoresist strip chambers. Preferred for processes requiring high-purity, transparent, and non-contaminating chamber liners.
