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AMAT AM9090-00923IT

  • Product Name: Quantum X Vacuum Control Processor Chassis
  • Product Description: A high-performance industrial control chassis housing the vacuum system control processor for Applied Materials' Quantum X ion implanter platforms.
  • Technical Specifications:
    • Form Factor: 19" Rack Mount (3U)
    • Processor: 32-bit RISC Industrial Controller

AMAT 0041-07790

  • Product Name: Electrostatic Chuck (ESC) Cover Ring
  • Product Description: A precision-machined ring that surrounds the electrostatic chuck, providing a uniform edge profile and protecting the ESC from process contamination.
  • Technical Specifications:
    • Material: Silicon Carbide (SiC) Ceramic Composite

AMAT 0041-10824

  • Product Name: 300mm Chamber Shield Liner
  • Product Description: A large, cylindrical metallic liner that protects the inner chamber walls from plasma exposure and defines the plasma reaction zone in semiconductor etch processes.
  • Technical Specifications:
    • Material: High-grade Aluminum Alloy (6061-T6)
    • Coating: Hard-anodized, 60μm thickness

AMAT 0200-20064

  • Product Name: Ceramic Isolator Spacer
  • Product Description: A high-purity ceramic component providing electrical isolation and physical spacing between charged electrodes in plasma process chambers.
  • Technical Specifications:
    • Material: 99.6% High-purity Alumina (Al₂O₃)

AMAT 0500-00143

  • Product Name: Water Flow Switch Assembly
  • Product Description: A precision flow switch that monitors cooling water circulation in heat exchanger systems. It provides interlock signals to prevent equipment overheating due to insufficient coolant flow.
  • Technical Specifications:
    • Flow Range: 1.0-5.0 L/min (adjustable)

AMAT 0190-34229

  • Product Name: Analog Input/Output (I/O) PCB Assembly
  • Product Description: A high-density analog interface printed circuit board that converts between sensor signals and digital control data for semiconductor tool automation systems.
  • Technical Specifications:
    • Analog Inputs: 16 channels, 0-10V / 4-20mA

AMAT 3750-01013

  • Product Name: Plasma Source Control Module
  • Product Description: A dedicated control module designed to regulate and monitor the operation of microwave plasma sources in semiconductor processing equipment. It ensures stable plasma ignition and sustained discharge for thin-film deposition and etching applications.
  • Technical Specifications:
    • Input Voltage: 200-240V AC, 3-phase

AMAT 0051-85514

  • Product Name: Pneumatic Valve Manifold Block
  • Product Description: Multi-station pneumatic valve manifold block for controlling pneumatic actuators in semiconductor tooling. It integrates multiple solenoid valves into a single, compact assembly.
  • Technical Specifications:
    • Valve Stations: 4-station manifold
    • Valve Type: 3/2-way, normally closed solenoid valves

AMAT 0041-49938

  • Product Name: Electrostatic Chuck (ESC) Insulator Ring
  • Product Description: High-performance dielectric insulator ring for electrostatic chuck assemblies. It provides electrical isolation between the chuck electrode and chamber ground while maintaining thermal stability.
  • Technical Specifications:
    • Material: Boron Nitride (BN) Ceramic Composite

AMAT 0041-38497

  • Product Name: Chamber Liner Assembly
  • Product Description: Precision-machined metallic chamber liner for semiconductor etch and deposition chambers. It protects the chamber body from process chemistry and defines the plasma reaction zone.
  • Technical Specifications:
    • Material: High-grade Aluminum Alloy (6061-T6)

AMAT 0040-84051

  • Product Name: 300mm Ceramic Heater Assembly
  • Product Description: High-performance ceramic heater for semiconductor wafer processing. It provides uniform, precise heating for wafer susceptors in high-vacuum deposition environments.
  • Technical Specifications:
    • Wafer Size: 300mm (12") compatible
    • Heating Element: Molybdenum embedded in alumina ceramic

AMAT 0021-23836

  • Product Name: Ceramic Shield Ring
  • Product Description: High-purity ceramic shield ring for plasma confinement and thermal protection in semiconductor process chambers. It shields chamber walls from direct plasma exposure and thermal stress.
  • Technical Specifications:
    • Material: 99.6% High-purity Alumina (Al₂O₃)
    • Dimensions: 300mm Outer Diameter (12")