Digital guide
You are here:
AMAT 0021-03804
- Product Name: Quartz Gas Injector Ring
- Product Description: A high-purity fused quartz component that distributes process gases uniformly across the wafer surface in semiconductor deposition chambers.
- Technical Specifications:
- Material: High-purity Fused Silica Quartz (SiO₂ > 99.99%)
Detailed content
-
- Outer Diameter: 310mm
- Inner Diameter: 250mm
- Thickness: 12mm
- Hole Configuration: 72 precision-drilled gas ports (0.8mm diameter)
- Max Operating Temperature: 1100°C
- Surface Finish: Ra < 0.5 μm (fire polished)
- Functional Features:
- Ultra-high purity to prevent process contamination
- Excellent chemical resistance to halogen process gases
- Precision-drilled holes for uniform gas distribution
- Low thermal expansion for dimensional stability
- Transparent to infrared radiation for temperature monitoring
- Smooth, non-porous surface minimizes particle adhesion
- Precision-machined flanges for vacuum sealing
- Applications: Process gas distribution in PECVD & ALD chambers; 300mm gas injector ring for Producer & Centura platforms.
