Digital guide
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AMAT 0010-09416
- Product Name: Etch RF Match Assembly
- Product Description: Automatic RF impedance matching network for P5000 Etch chambers. It optimizes power transfer between the RF generator and plasma load by adjusting impedance to minimize reflected power.
- Technical Specifications:
- Frequency: 13.56 MHz
Detailed content
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- Power Rating: 3 kW
- Input Voltage: 208V AC 3-phase
- Matching Speed: <100ms
- Reflected Power Limit: <5%
- Control Interface: Analog 0–10V, RS-232
- Cooling: Forced air cooling
- Dimensions: 420 × 220 × 280 mm
- Weight: 18 kg
- Functional Features:
- Auto-tuning with stepper motor-controlled capacitors
- Fast arc detection and protection
- Constant impedance regulation during plasma fluctuations
- Over-temperature and over-power shutdown
- Remote control and monitoring capability
- Built-in self-calibration routine
- Applications: RF impedance matching for dielectric and silicon etch processes in P5000 MERIE chambers.
