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AMAT 0020-09796
- Product Name: Shield, Quartz, Chamber Liner
- Product Description: High-purity fused silica quartz shield for protecting chamber walls and components from plasma exposure in semiconductor etch processes.
- Technical Specifications:
- Material: High-purity synthetic quartz (SiO₂, <1 ppm metallic impurities)
Detailed content
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- Wall Thickness: 4.5 mm ± 0.1 mm
- Temperature Resistance: Up to 1,200°C continuous
- Thermal Shock Resistance: >120°C/sec
- Optical Transparency: >90% at 254 nm
- Surface Finish: Double-side polished, Ra ≤ 0.05 μm
- Functional Features:
- Excellent resistance to fluorine and chlorine plasma erosion
- High thermal shock resistance for rapid thermal cycling
- Non-porous, smooth surface prevents particle accumulation
- Transparent to process monitoring UV and IR radiation
- Low outgassing for UHV compatibility
- Easy to clean and replace during preventive maintenance
- Application Scenarios:
- Installed in AMAT DPS II and eMax etch chambers
- Used in high-density plasma dielectric etch processes
- Deployed in 200mm and 300mm wafer fabrication environments
- Applied in advanced node semiconductor manufacturing (≤7nm)
- Utilized in processes requiring ultra-high purity materials to prevent contamination
