Digital guide
You are here:
AMAT 0200-01915
Product Name: Quartz Focus Ring
Product Description: A high-purity fused quartz component that surrounds the wafer pedestal, focusing plasma and process gases toward the wafer surface to enhance deposition uniformity and prevent edge effects.
Technical Specifications:
- Material: Synthetic fused silica (SiO₂, >99.999% purity)
Detailed content
- Outer Diameter: 350mm
- Inner Diameter: 300mm
- Thickness: 10mm
- Surface Finish: Fire-polished / Precision ground (Ra < 0.5μm)
- Thermal Expansion Coefficient: 5.5×10⁻⁷ /°C
- Maximum Operating Temperature: 1100°C
- Vacuum Compatibility: 10⁻⁸ Torr
Functional Features:
- Ultra-high purity eliminates metallic contamination
- High transmittance for plasma energy transfer
- Excellent thermal shock resistance
- Non-porous surface prevents particle entrapment
- Chemical inertness to all semiconductor process gases
Application Scenarios: Focusing plasma in PECVD, PVD, and Etch chambers for 300mm wafer processes, improving film uniformity and reducing edge bead effects.
