Digital guide
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AMAT 0224-43065
Product Name: Quartz Gas Distribution Showerhead
Product Description: A high-purity fused quartz component with precision-drilled orifices, designed for uniform distribution of process gases across the wafer surface in semiconductor deposition chambers.
Technical Specifications:
- Material: Synthetic fused silica (SiO₂, >99.999% purity)
Detailed content
- Diameter: 300mm
- Thickness: 12mm
- Orifice Count: 600 (0.5mm diameter)
- Surface Finish: Fire-polished, Ra < 0.5μm
- Thermal Expansion Coefficient: 5.5 × 10⁻⁷ /°C
- Maximum Operating Temperature: 1100°C
- Vacuum Compatibility: 10⁻⁸ Torr
Functional Features:
- Ultra-high purity eliminates metallic contamination
- Uniform gas distribution for consistent film thickness
- High chemical inertness to all semiconductor process gases
- Low thermal expansion ensures dimensional stability at high temps
- Non-porous surface prevents particle entrapment
Application Scenarios: Gas distribution in PECVD, LPCVD, and ALD chambers for depositing thin films on 300mm wafers.
