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Gasonics C12932-2
Product Description: The Gasonics C12932-2 is typically identified as a Gas Distribution Manifold or a Showerhead Assembly. This component is located at the top of the process chamber and is responsible for delivering process gases uniformly across the surface of the wafer.
Technical Specifications:
- Component Type: Gas Showerhead / Distribution Plate
- Material: Aluminum (Anodized) or Stainless Steel 316L (Electropolished)
Detailed content
- Orifice Design: Laser-drilled or machined holes for laminar flow
- Gas Inlets: Multiple ports (typically 4 to 8) for different process gases
- Sealing: Fluoropolymer (Kalrez or Viton) O-rings for chemical compatibility
- RF Compatibility: Often acts as an electrode in capacitively coupled plasma systems
Functional Features:
- Flow Uniformity: Engineered hole pattern ensures equal gas distribution, critical for uniform etch or deposition rates.
- Plasma Confinement: In plasma tools, the showerhead often serves as the powered electrode, igniting and sustaining the plasma.
- Showerhead Cleaning: Some designs include a mechanism to prevent clogging of gas orifices by polymer deposits.
- Modular Design: Allows for easy disassembly for cleaning or replacement of specific gas lines.
Application Scenarios:
- PECVD Systems: Used to distribute precursor gases for thin film deposition.
- Plasma Etching: Distributes etchant gases (CF4, Cl2, BCl3) uniformly over the wafer.
- Ashing: Distributes oxygen or forming gas for photoresist removal.
- Gas Mixing: Internal plenum allows for pre-mixing of gases before they enter the chamber.
