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Gasonics AWO-1-14
Product Description: The Gasonics AWO-1-14 is an Automated Wet Oxidation system or a specific Wet Bench Station configuration. The “AWO” prefix suggests a focus on wet chemical processing, potentially for cleaning or oxidation, while “1-14” indicates a single-tank module or a specific chemical delivery configuration. It is designed for batch processing of wafers.
Technical Specifications:
- System Type: Automated Wet Bench Station / Single Tank Module
- Process Type: Wet Chemical Cleaning, RCA Clean, or Oxidation (H2O2/H2SO4)
Detailed content
- Wafer Size: 150mm (6-inch) to 200mm (8-inch) cassettes
- Tank Material: PFA (Perfluoroalkoxy) or Quartz for high purity
- Temperature Control: 30°C to 85°C (with heater/chiller)
- Agitation: Megasonic transducer or bubble agitation
- Chemicals: SPM, SC1, SC2, HF, BHF
Functional Features:
- Automated Cassette Handling: Robot lifts wafers from cassette and immerses them into the chemical tank.
- Chemical Recirculation: Filter and recirculation loop to maintain chemical purity and extend bath life.
- QDR (Quick Dump Rinse): Capability to rapidly dump the tank and refill with DI water to stop chemical action.
- Fume Hood Integration: Enclosed design with local exhaust to handle corrosive acid vapors.
Application Scenarios:
- RCA Cleaning: Standard pre-gate cleaning to remove organic and metallic contaminants.
- Piranha Clean: Removal of heavy organic residues and photoresist.
- HF Dip: Oxide strip or surface preparation before deposition.
- Oxidation: Growth of thin oxide layers using heated peroxide mixtures.
- Bulk Micromachining: Etching of silicon using KOH or TMAH solutions.
