Digital guide
You are here:
Gasonics AWD-D-3-6-002
Product Description: The Gasonics AWD-D-3-6-002 is a Dual-Chamber Decoupled Plasma Strip System configured for specific process requirements, likely indicating a 3-slot load lock and a 6-gas line configuration. It is a robust tool designed for production environments requiring high uniformity and repeatability in photoresist removal and surface cleaning.
Technical Specifications:
- System Type: Dual-Chamber Downstream Plasma Stripper
Detailed content
- Wafer Size: Primarily 200mm (8-inch), with 150mm (6-inch) capability
- RF System: Independent 2000W – 3000W generators per chamber
- Gas Configuration: 6 independent gas lines with high-precision MFCs
- Pressure Control: 10 mTorr to 2 Torr with fast-acting throttle valve
- Temperature Control: Electrostatic chuck with heating and cooling (-20°C to +150°C)
Functional Features:
- Recipe Management: Stores hundreds of process recipes with strict version control and user access levels.
- In-Situ Chamber Clean: Capability to perform plasma cleans (using NF3 or O2) without breaking vacuum.
- Particle Control: Class 1 particle performance (minimal particles >0.2um) ensured by laminar flow design.
- Redundancy: Optional dual pumps and power supplies for high availability manufacturing.
Application Scenarios:
- Foundry Production: Critical layer stripping for logic devices.
- MEMS Post-Processing: Release etching where uniform stripping is critical.
- Image Sensors: Cleaning of CMOS/CCD sensors without damaging microlenses.
- LED Manufacturing: Substrate cleaning for GaN-on-Sapphire processes.
