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Gasonics AWD-D-2-8-8
Product Description: The Gasonics AWD-D-2-8-8 is a dual-chamber automated wet decoupling system. The “D” denotes a Dual configuration, allowing for simultaneous processing or sequential processing of two wafers to increase throughput. The “2-8-8” typically indicates a 2-chamber setup capable of processing 8-inch wafers with specific process module configurations.
Technical Specifications:
- System Type: Dual Chamber Decoupled Plasma Strip System
Detailed content
- Throughput: High-volume manufacturing capability with dual-station operation
- Wafer Size: 200mm (8-inch) primary, with expandability
- RF Configuration: Independent RF generators for each chamber (e.g., 2 x 2000W)
- Gas Handling: Dedicated gas lines and mass flow controllers (MFCs) for each chamber
- Pressure Range: 10 mTorr to 2 Torr
Functional Features:
- Parallel Processing: Two chambers can run different recipes simultaneously, effectively doubling throughput for specific steps.
- Cluster Tool Integration: Designed to be integrated into a larger cluster tool environment with a central robot.
- In-Situ Cleaning: Capability to perform chamber cleans (dry or wet) without breaking vacuum or opening the load lock.
- Software Recipe Management: Stores hundreds of process recipes with strict version control for SEMI compliance.
Application Scenarios:
- High-Volume Production: Foundries and memory fabs requiring high throughput photoresist stripping.
- 3D NAND Manufacturing: Stripping of multiple layers of sacrificial materials in 3D NAND flash memory production.
- Compound Semiconductors: Processing of GaN and SiC wafers for power electronics.
- MEMS Post-Processing: Release etching where uniform stripping is critical across the wafer.
