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Gasonics AE 2001 RF Generator
Introduction:
The Gasonics AE 2001 is a high-performance RF (Radio Frequency) power generator. The “AE” prefix often indicates an “Advanced Energy” compatible or Gasonics-branded solid-state generator. It is designed to deliver precise RF power for plasma generation in semiconductor manufacturing processes like etching, deposition, and ashing.
Technical Specifications:
- Type: Solid State RF Power Generator
Detailed content
- Frequency: 13.56 MHz (Fixed or Tunable)
- Power Output: 1000W to 5000W (Configurable)
- Output Impedance: 50 Ohms
- Input Power: 208/230/460 VAC, 3-Phase
- Efficiency: > 85%
- Cooling: Forced Air or Water
- Control: Digital Touchscreen, RS-232, Ethernet
Functional Features:
- Automatic Matching: Integrated or remote matching network control for low reflected power.
- Pulse Modulation: Capable of high-speed pulsing for specialized etch processes.
- Arc Detection: Fast suppression of arcs to protect the generator and chamber.
- Frequency Agility: Some models offer frequency sweeping to optimize plasma density.
- Remote Control: Full digital interface for integration into factory automation (SECS/GEM).
Application Scenarios:
- High-Density Plasma Etching: Powering ICP (Inductively Coupled Plasma) sources.
- PECVD: Providing RF energy for film deposition.
- Sputtering: Driving magnetron sputtering sources.
- Photoresist Ashing: High-power oxygen plasma stripping.
- Surface Modification: Plasma treatment of wafers for adhesion promotion.
