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Gasonics 17329-01 Gas Distribution Manifold
Product Description: This part is a precision-machined gas manifold or sub-block that houses Mass Flow Controllers (MFCs) and internal channels for delivering process gases to the plasma chamber. It ensures leak-tight gas delivery and accurate mixing ratios.
Technical Specifications:
- Material: 316L Stainless Steel (Electropolished)
- Gas Channels: Multiple independent channels (typically 2 to 4 gases)
Detailed content
- Sealing: VCR or Face Seal metal gasket connections
- MFC Mounting: Compatible with standard industry MFC form factors
- Leak Rate: < 1 x 10^-9 scc/s Helium
- Surface Finish: High polish to minimize surface area for gas adsorption
Functional Features:
- Gas Mixing: Allows precise ratio control of multiple gases before entering the chamber.
- Thermal Stability: Designed to minimize temperature gradients that could affect MFC accuracy.
- Modularity: Allows for quick replacement or reconfiguration of gas lines.
- Contamination Control: Low-outgassing materials prevent introducing impurities into the plasma.
Application Scenarios:
- Reactive Ion Etching (RIE): Delivering precise ratios of etchant gases (e.g., CF4/O2, Cl2/Ar).
- Plasma Enhanced CVD (PECVD): Supplying precursor gases like Silane, Ammonia, and Nitrous Oxide.
- Surface Treatment: Mixing inert gases (Argon) with reactive gases (Oxygen) for sputter cleaning or activation.
- Abatement Systems: Routing toxic or corrosive gases safely to the scrubber.
