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Gasonics 17305-01
Product Description: This part number typically identifies a specific sub-assembly, often a Chuck Heater Assembly or a Thermal Control Module for Gasonics plasma strip tools. It is a critical component responsible for maintaining precise temperature control of the wafer during processing, which is essential for controlling etch rates and preventing thermal stress.
Technical Specifications:
- Component Type: Electrostatic Chuck (ESC) Heater / Temperature Control Module
Detailed content
- Material: Aluminum or Aluminum Nitride (AlN) ceramic body
- Heating Element: Embedded resistive heating coils or Peltier elements
- Temperature Range: -20°C to +250°C (typical operating range)
- Power Rating: 1000W to 3000W heating power
- Cooling Method: Liquid coolant (water or glycol) or compressed air
- Sensor Type: RTD (Pt100) or Thermocouple embedded in the chuck
Functional Features:
- Precision Thermal Control: Maintains wafer temperature stability within ±1°C to ensure process repeatability.
- Rapid Thermal Response: Designed for fast ramp-up and cool-down rates to reduce cycle times.
- Helium Backside Cooling: Incorporates channels for helium gas to enhance thermal transfer between the wafer and the chuck.
- Vacuum Clamping: Integrated vacuum channels to hold the wafer firmly in place during plasma processing.
Application Scenarios:
- Temperature-Sensitive Processes: Used when processing wafers with temperature-sensitive layers (e.g., certain polymers or metals).
- Cryogenic Processing: Specific configurations allow for sub-ambient processing to condense gases or suppress chemical reactions.
- High-Temperature Ashing: Used to accelerate the ashing rate of hard-baked photoresists.
- System Refurbishment: Replacement part for upgrading the thermal capabilities of older Gasonics tools.
