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Gasonics 16025-02 Process Chamber Liner
Introduction:
The Gasonics 16025-02 is a protective consumable component, typically serving as a chamber liner or shield. It is installed inside the plasma processing chamber to protect the main chamber walls and expensive internal components from chemical corrosion, physical sputtering, and particle contamination generated during high-energy plasma processes.
Technical Specifications:
- Material: High-purity Aluminum (Al 6061-T6), Anodized Aluminum, or Quartz (depending on specific chemistry)
Detailed content
- Dimensions: Custom geometry fitting specific Gasonics chamber models (e.g., 200mm or 300mm wafer compatibility)
- Thickness: Typically 5mm to 10mm to ensure structural integrity and lifespan
- Surface Finish: Hard anodized for plasma resistance and low particle generation
- Temperature Resistance: Up to 200°C continuous operation
Functional Features:
- Erosion Resistance: Acts as a sacrificial layer, absorbing ion bombardment and chemical attack that would otherwise damage the stainless steel chamber body.
- Particle Control: Smooth surface finish minimizes the trapping of byproducts and prevents flaking, reducing defect density on wafers.
- Chemical Compatibility: Resistant to strong acids and bases used in wet cleaning or plasma chemistries (e.g., Oxygen, CF4, SF6).
- Easy Replacement: Designed for quick removal and replacement during preventive maintenance (PM) cycles to minimize tool downtime.
Application Scenarios:
- Plasma Ashing: Protects the chamber during oxygen plasma ashing of photoresist.
- Etch Processes: Shields the chamber during reactive ion etching (RIE) processes.
- PVD/CVD Chambers: Used as a shield in physical or chemical vapor deposition tools to prevent target material coating the walls.
- High-K Metal Gate Processing: Critical in advanced logic processes where chamber purity is paramount.
