Digital guide
You are here:
AMAT V051-1/4 Precision Pressure Regulator
Product Overview: The AMAT V051-1/4 is a high-precision pressure regulator designed for use in the gas delivery and vacuum systems of Applied Materials semiconductor equipment. It is responsible for reducing and stabilizing the pressure of process gases or vacuum systems, ensuring that the correct pressure is maintained throughout the semiconductor manufacturing process. This regulator is engineered with high-purity materials and precision control mechanisms to deliver exceptional pressure stability, minimal pressure drop, and compatibility with harsh process gases, making it a critical component for process consistency.
Technical Specifications: – Pressure Range: Inlet pressure: 0.1-10 MPa (14.5-1450 psi), outlet pressure: 0-1 MPa (0-145 psi), adjustable with a precision of ±0.001 MPa. – Pressure Stability: ±0.1% of set pressure over 24 hours, ensuring consistent process conditions. – Material Composition: Body made of 316L stainless steel (electropolished internal surface, surface roughness ≤ 0.1 μm), diaphragm made of Hastelloy C-276 for corrosion resistance.
Detailed content
– Flow Capacity: 100 standard liters per minute (SLPM) at 0.5 MPa outlet pressure. – Connection Size: 1/4 inch NPT (National Pipe Thread) for inlet and outlet, compatible with standard gas fittings. – Operating Temperature: -20°C to 80°C, with a maximum temperature resistance of 100°C for short-term operation. – Leak Rate: ≤ 1×10⁻⁹ Pa·m³/s (He), ensuring minimal gas leakage. – Certification: Complies with SEMI F11 standards for gas pressure components and ISO 9001 quality control requirements. – Weight: 0.3kg, with a compact design for easy installation in tight equipment spaces.
Functional Features: – Reduces high inlet pressure to a stable, precise outlet pressure, ensuring consistent gas flow and process conditions. – Features a sensitive diaphragm design to respond quickly to pressure changes, maintaining stable outlet pressure even with variations in inlet pressure or flow rate. – Resists corrosion from reactive and corrosive process gases (e.g., CF₄, Cl₂, NH₃), extending component service life. – Minimizes pressure drop across the regulator, ensuring efficient gas delivery and reducing energy consumption. – Includes a pressure gauge (accuracy: ±1% full scale) for real-time pressure monitoring. – Features a locking mechanism to prevent accidental adjustment of the outlet pressure, ensuring process stability. – Designed for easy maintenance, with removable components for cleaning and calibration.
Application Scenarios: – Installed in AMAT’s gas delivery systems for process gases (inert, reactive, corrosive) and vacuum systems. – Used in CVD, PECVD, etching, and ion implantation equipment for 200mm and 300mm wafer manufacturing. – Applied in processes requiring precise pressure control, such as thin film deposition, plasma etching, and gas mixing. – Suitable for semiconductor fabs with strict process control requirements, where pressure stability is critical to wafer quality. – Ideal for high-volume production lines, where equipment uptime and process consistency are essential. – Used in research and development laboratories for developing new gas-based semiconductor processes.
