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AMAT LI-9496 Wafer Level Inspection Camera Module
Product Overview: The AMAT LI-9496 is a high-resolution wafer level inspection camera module designed for Applied Materials semiconductor wafer inspection systems. It provides real-time, high-resolution imaging of wafer surfaces, detecting defects, particles, and process variations during manufacturing. This module features advanced CCD/CMOS sensor technology, high-speed data transfer, and seamless integration with AMAT’s inspection software, enabling precise wafer quality control.
Technical Specifications:
- Sensor Type: 12-megapixel CMOS sensor, with a global shutter for high-speed imaging.
- Resolution: 4096×3072 pixels, with a pixel size of 3.45μm.
Detailed content
- Frame Rate: 30 frames per second (fps) at full resolution, 120 fps at reduced resolution.
- Interface: USB 3.0 and GigE Vision, supporting high-speed data transfer up to 5 Gbps.
- Lens: Fixed-focus high-resolution industrial lens, with a field of view of 300mm×225mm.
- Operating Environment: Cleanroom Class 1, temperature 18–25°C, humidity 40–60% (non-condensing).
- Lighting: Integrated LED ring light (white, 5000K), with adjustable intensity.
- Dimensions: 150mm×100mm×80mm, weight 1.2kg.
- Certification: Complies with SEMI S2/S8 safety standards and ISO 14644-1 cleanroom requirements.
Functional Features:
- Delivers high-resolution, real-time wafer imaging for defect detection.
- Provides fast data transfer for real-time inspection and analysis.
- Integrated LED lighting ensures uniform illumination for accurate defect detection.
- Seamless integration with AMAT’s wafer inspection software for automated quality control.
- Features rugged, cleanroom-compatible construction for long-term reliability.
- Supports remote monitoring and control for fab-wide quality management.
Application Scenarios:
- Installed in AMAT wafer inspection systems for in-line and post-process defect detection.
- Used in 200mm and 300mm wafer fabs for logic, memory, and power semiconductor manufacturing.
- Applied in processes requiring high-precision defect detection (≤5nm nodes).
- Ideal for high-volume production lines requiring 100% wafer quality inspection.
- Deployed in R&D facilities for wafer process development and defect analysis.
