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AMAT AFC550
Product Name: AFC550 Mass Flow Controller (MFC)
Product Introduction: A precision gas flow control device designed for semiconductor manufacturing processes, providing accurate regulation of process gas flow rates.
Technical Specifications:
- Flow Rate Range: 6–300 cc/min (hydrogen), 20–1000 sccm (nitrogen), up to 10 SLPM (other gases)
Detailed content
- Compatible Gases: Nitrogen (N₂), Hydrogen (H₂), and other semiconductor process gases
- Operating Pressure: Compatible with ultra-high vacuum (UHV) and process pressure environments
- Dimensions: Approximately 10.00 x 8.00 x 4.50 inches; Weight: 6.35 lbs
- Electrical Interface: Standard industrial control signals for integration with semiconductor tool systems
Functional Features:
- High-precision flow measurement and control with minimal drift
- Fast response time for dynamic process gas adjustments
- UHV-compatible construction for clean semiconductor process environments
- Robust design for long-term reliability in harsh manufacturing conditions
- Compatibility with AMAT Centura, P5000, and other semiconductor processing platforms
Application Scenarios:
- Chemical Vapor Deposition (CVD) processes
- Physical Vapor Deposition (PVD) processes
- Etching and cleaning operations in semiconductor wafer fabrication
- Gas delivery systems for 200mm and 300mm wafer processing tools
- Process gas control in advanced semiconductor manufacturing facilities
