Digital guide
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AMAT 3750-01013
- Product Name: Plasma Source Control Module
- Product Description: A dedicated control module designed to regulate and monitor the operation of microwave plasma sources in semiconductor processing equipment. It ensures stable plasma ignition and sustained discharge for thin-film deposition and etching applications.
- Technical Specifications:
- Input Voltage: 200-240V AC, 3-phase
Detailed content
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- Control Signal: Analog 0-10V & Digital RS-232
- Output Power: 0-3kW Adjustable
- Operating Frequency: 2.45 GHz
- Protection Circuits: Over-voltage, over-current, over-temperature, and arc detection
- Dimensions: 483 x 130 x 300 mm (19″ rack mount)
- Weight: 8.5 kg
- Functional Features:
- Closed-loop power regulation for consistent plasma intensity
- Fast arc detection and auto-quenching to protect chamber components
- Programmable power ramps for gentle plasma ignition
- Real-time status monitoring with LED indicators
- Remote control interface for factory automation integration
- Built-in self-diagnostic routines for fault identification
- Applications: Plasma source control in PECVD, Etch, and Ashing chambers; primarily used in Producer & Centura platforms for dielectric film deposition.
