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AMAT 3700-01390 High-Pressure Gas Regulator Assembly
Product Description: A precision high-pressure gas regulator designed for controlling the pressure of ultra-high-purity process gases in semiconductor manufacturing. It reduces high-pressure gas from cylinder or bulk supply to a stable, low-pressure output suitable for process chamber use, ensuring consistent gas flow and pressure stability. The regulator is engineered for UHP compatibility, low outgassing, and resistance to aggressive process chemistries.
Technical Specifications:
– Input Pressure Range: 0–3000 PSIG
– Output Pressure Range: 0–250 PSIG (adjustable)
Detailed content
– Flow Capacity: 100 slm (standard liters per minute)
– Accuracy: ±1% of full scale
– Material: 316L electropolished stainless steel (wetted surfaces)
– Seal Material: PTFE (perfluoroethylene propylene) for UHP compatibility
– Connection Type: 1/4-inch VCR face-seal fittings (input and output)
– Operating Temperature: -40°C to +120°C
– Leak Rate: < 1×10⁻⁹ atm·cc/s He
– Compliance: SEMI C12, RoHS, CE
Functional Features:
– Precise pressure regulation with minimal pressure droop during flow changes
– UHP design with electropolished surfaces and PTFE seals to minimize outgassing and particle generation
– Rugged construction for long-term reliability in harsh fab environments
– Easy-to-adjust pressure control knob with locking mechanism to prevent accidental changes
– Built-in pressure relief valve for over-pressure protection
– Compatible with all common semiconductor process gases (inert, reactive, corrosive)
– Compact design for installation in gas panels and cylinder cabinets
Application Scenarios:
– High-pressure gas supply for CVD, ALD, and etch process chambers
– Bulk gas distribution systems in semiconductor fabs
– Specialty gas cylinder pressure regulation
– Gas panel pressure control for multi-gas process recipes
– Purge gas pressure regulation for load locks and transfer chambers
