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Technical Specifications:
- Frequency Range: 400 kHz to 13.56 MHz (typical RF plasma frequencies)
- Power Handling: Up to 5 kW
- Insulation: High-voltage dielectric materials
Functional Features:
- Monitors forward/reflected power or impedance in real-time
- Ensures maximum power transfer to the plasma by facilitating impedance matching
- High isolation to prevent RF interference with other electronics
- Robust construction to withstand high voltage and thermal stress
Application: Installed in RF generators and match networks for Etch and PVD chambers, critical for stable plasma ignition and sustained operation.
