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AMAT 0240-33168
Product Name: RF Match Network Assembly
Product Description: A high-performance impedance matching network designed for precise RF power delivery in semiconductor plasma processing equipment. It ensures maximum power transfer between the RF generator and process chamber.
Technical Specifications:
- Frequency Range: 13.56 MHz (standard)
Detailed content
- Power Handling: Up to 5 kW
- Impedance Range: 5–500 ohms
- Control Interface: Analog (0–10V) or digital (RS-485)
- Cooling: Forced air or liquid cooling
- Operating Temperature: 0°C to +50°C
Functional Features:
- Fast, automatic impedance matching
- High power transfer efficiency
- Stable performance across process conditions
- Over-voltage and over-current protection
- Remote control and monitoring capability
- Compact, rack-mountable design
Application Scenarios:
- Plasma etch systems
- PECVD and ALD processes
- RF sputtering deposition
- Semiconductor wafer cleaning
- AMAT Centura etch platforms
