Digital guide
You are here:
AMAT 022-27837
- Product Name: Ceramic Chamber Liner Insert
- Product Description: A high-purity, machined ceramic component that lines the interior of a semiconductor process chamber, protecting the chamber walls and maintaining process purity.
- Technical Specifications:
- Material: High-density, high-purity alumina (Al2O3, > 99.8%).
Detailed content
AMAT 022-27837
-
- Coating: Optional plasma-sprayed yttria (Y2O3) coating for enhanced plasma and etchant resistance.
- Dimensional Tolerance: Precision machined to tight tolerances (< ±0.05 mm) for exact fit.
- Surface Finish: Smooth, non-porous surface finish (Ra < 0.8 μm) to prevent particle generation.
- Functional Features:
- Excellent resistance to chemical attack from halogen plasmas (F, Cl).
- High thermal shock resistance, stable under extreme thermal cycling.
- Low particulate generation, critical for defect-free wafer fabrication.
- Acts as a thermal barrier, stabilizing chamber temperature profiles.
- Application Scenarios: Used in high-temperature etch and deposition chambers (e.g., dielectric etch, ALD) to extend chamber life and ensure process cleanliness.
