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AMAT 0200-39199
Product Name: Quartz Process Shield Assembly
Product Description: A precision-engineered quartz shield assembly for semiconductor process chambers. It provides high-purity, non-contaminating protection for chamber components while maintaining excellent thermal and electrical properties.
Technical Specifications:
- Material: High-purity fused silica quartz (99.999%)
Detailed content
- Diameter: 300 mm
- Thickness: 6 mm
- Surface Finish: Polished to Ra < 0.2 μm
- Temperature Resistance: Up to 1200°C
- Dielectric Strength: > 20 kV/mm
- Chemical Compatibility: Inert to all semiconductor process gases
- Dimensional Tolerance: ± 0.05 mm
Functional Features:
- Ultra-high purity to prevent wafer contamination
- Excellent thermal shock resistance
- High electrical insulation properties
- Low particle generation during operation
- Transparent to process monitoring wavelengths
- Easy cleaning and maintenance
Application Scenarios:
- Semiconductor etching chambers
- PVD/CVD process tools
- High-temperature wafer processing
- Plasma-enhanced deposition systems
- Vacuum chamber component protection
